SCHEMBL690705

SCHEMBL690705

CCOc1cccc(C(C)=O)c1OCC

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.53
TSHR P16473 1/20 0.53
LMNA P02545 5/20 0.53
MAPT P10636 3/20 0.53
L3MBTL1 Q9Y468 2/20 0.53
HCRTR1 O43613 2/20 0.50
MEN1 O00255 1/20 0.50
KMT2A Q03164 1/20 0.50
SMN1; SMN2 Q16637 2/20 0.49
KDM4E B2RXH2 2/20 0.49
ALDH1A1 P00352 2/20 0.49
KCNK3 O14649 1/20 0.48
KCNK9 Q9NPC2 1/20 0.48
GLA P06280 1/20 0.47
RAB9A P51151 1/20 0.44
GAA P10253 1/20 0.44
MAPK1 P28482 1/20 0.44
CA9 Q16790 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
KLK1 P06870 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5696504 0.90 SMN1; SMN2 (0.54) CYP3A4TSHRLMNAMAPTL3MBTL1
SCHEMBL2108364 0.87 HCRTR1 (0.51) TSHRLMNAMAPTL3MBTL1HCRTR1
SCHEMBL3424538 0.86 MAPK1 (0.53) TSHRLMNAL3MBTL1HCRTR1MEN1
SCHEMBL29768766 0.86 MAPK1 (0.53) TSHRLMNAL3MBTL1HCRTR1MEN1
SCHEMBL16950864 0.85 HCRTR1 (0.45) CYP3A4TSHRLMNAMAPTL3MBTL1
SCHEMBL27574878 0.84 HCRTR1 (0.49) TSHRLMNAMAPTL3MBTL1HCRTR1
SCHEMBL3189724 0.84 TSHR (0.53) CYP3A4TSHRLMNAMAPTL3MBTL1
SCHEMBL9653311 0.84 HCRTR1 (0.49) TSHRLMNAMAPTL3MBTL1HCRTR1
SCHEMBL10498173 0.84 TSHR (0.55) CYP3A4TSHRLMNAMAPTL3MBTL1
SCHEMBL335970 0.83 LMNA (0.71) CYP3A4TSHRLMNAMAPTL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 175 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102388109-A UV curable, abrasion resistant, antistatic coatings filled with carbon nanotubes BAYER MATERIALSCIENCE AG 2012-03-21 CN claimed
CN-111538209-B Photosensitive resin composition, organic EL element partition wall, and organic EL element 日保丽公司 2024-05-14 CN disclosed
CN-117858927-A Silicone resin composition for forming cured film, and method for producing polysiloxane 东丽株式会社 2024-04-09 CN disclosed
CN-115427514-B Resin composition, light-shielding film, and substrate with partition wall 东丽株式会社 2024-01-02 CN disclosed
US-11822243-B2 Negative-type photosensitive resin composition, cured film, element and display device provided with cured film, and production method therefor TORAY INDUSTRIES, INC. (JP) 2023-11-21 US disclosed
CN-116893570-A Phosphor dispersion and phosphor photosensitive composition using the same 山阳色素株式会社 2023-10-17 CN disclosed
WO-2023182263-A1 PRODUCTION METHOD FOR LED-MOUNTED SUBSTRATE WITH CURED FILM 東レ株式会社 2023-09-28 WO disclosed
CN-116802713-A Substrate with partition wall, wavelength conversion substrate, display, and method for manufacturing wavelength conversion substrate 东丽株式会社 2023-09-22 CN disclosed
CN-115485307-B Water-soluble saccharide, photosensitive composition, and method for producing water-soluble saccharide 群荣化学工业株式会社 2023-09-08 CN disclosed
EP-3284771-B1 HEAT-RESISTANT RESIN COMPOSITION, METHOD FOR MANUFACTURING HEAT-RESISTANT RESIN FILM, METHOD FOR MANUFACTURING INTERLAYER INSULATION FILM OR SURFACE PROTECTIVE FILM, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT OR SEMICONDUCTOR COMPONENT TORAY INDUSTRIES (JP) 2023-08-30 EP disclosed
CN-1386116-A Fumarate derivative, method for producing the same SHOWA DENKO KK (JP) 2002-12-18 CN disclosed
US-20020008470-A1 Paste, display member, and process for production of display member TORAY INDUSTRIES INC. (JP) 2002-01-24 US disclosed
EP-1158019-A2 Paste, display member, and process for production of display member TORAY INDUSTRIES, INC. (JP) 2001-11-28 EP disclosed
US-6143197-A MIXING A COPOLYMER OF ETHYLENE AND A VINYL UNSATURATED ALICYCLIC MONOMER, A TRANSITION METAL CATALYST, SHAPING TO FORM A PACKAGING MATERIAL OR FILM, EXPOSING THE FORMED FILM OR PACKAGING MATERIAL TO ACTINIC OR ELECTRON BEAM RADIATION CRYOVAC, INC. (US) 2000-11-07 US disclosed
EP-0328669-A1 CHALCONE DERIVATIVE COMPOUNDS NIPPON OIL AND FATS COMPANY, LIMITED (JP) 1989-08-23 EP disclosed
EP-0034178-A4 OPHTHALMIC LENS BLANK WITH PROTECTIVE COATING. MINNESOTA MINING & MFG (US) 1982-07-30 EP disclosed
EP-0034178-A1 OPHTHALMIC LENS BLANK WITH PROTECTIVE COATING. MINNESOTA MINING & MFG (US) 1981-08-26 EP disclosed
WO-1981000536-A1 OPHTHALMIC LENS BLANK WITH PROTECTIVE COATING MINNESOTA MINING & MFG (US) 1981-03-05 WO disclosed
US-4237185-A CELLULOSE, ACRYLATE MONOMER AND OLIGOMER THE RICHARDSON COMPANY (US) 1980-12-02 US disclosed
US-4112182-A CELLULOSE ESTER ARTICLE COATED WITH RADIATION CURABLE UNSATURATED CELLULOSE ESTER- ACRYLATE EASTMAN KODAK COMPANY (US) 1978-09-05 US disclosed