SCHEMBL6907530

SCHEMBL6907530

Cc1ccc(N=C=O)cc1N=C=S

nearest known ligand 0.79

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 7/20 0.79
TRPA1 O75762 1/20 0.79
ALDH1A1 P00352 6/20 0.47
LMNA P02545 1/20 0.47
TDP1 Q9NUW8 5/20 0.43
MAPK1 P28482 1/20 0.43
TSHR P16473 1/20 0.37
KDM4E B2RXH2 3/20 0.37
USP2 O75604 3/20 0.37
MAPT P10636 3/20 0.37
MEN1 O00255 1/20 0.37
NPC1 O15118 1/20 0.37
RAB9A P51151 1/20 0.37
BLM P54132 1/20 0.37
KMT2A Q03164 1/20 0.37
HPGD P15428 4/20 0.34
HSD17B10 Q99714 3/20 0.34
P2RY6 Q15077 2/20 0.34
LTA P01374 2/20 0.34
P2RX3 P56373 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL181372 0.93 CYP3A4 (0.79) CYP3A4TRPA1ALDH1A1LMNATDP1
SCHEMBL29454984 0.93 CYP3A4 (0.79) CYP3A4TRPA1ALDH1A1LMNATDP1
Toluene Diisocyanate SCHEMBL29350148 0.89 CYP3A4 (1.00) CYP3A4TRPA1ALDH1A1LMNATDP1
Toluene Diisocyanate SCHEMBL19733056 0.89 CYP3A4 (1.00) CYP3A4TRPA1ALDH1A1LMNATDP1
Toluene Diisocyanate SCHEMBL29737260 0.89 CYP3A4 (1.00) CYP3A4TRPA1ALDH1A1LMNATDP1
Toluene Diisocyanate SCHEMBL28174227 0.89 CYP3A4 (1.00) CYP3A4TRPA1ALDH1A1LMNATDP1
Toluene Diisocyanate SCHEMBL15384 0.89 CYP3A4 (1.00) CYP3A4TRPA1ALDH1A1LMNATDP1
SCHEMBL29463953 0.89 CYP3A4 (0.60) CYP3A4TRPA1ALDH1A1LMNATDP1
SCHEMBL484205 0.89 CYP3A4 (0.60) CYP3A4TRPA1ALDH1A1LMNATDP1
Toluene Diisocyanate SCHEMBL11209945 0.87 CYP3A4 (0.96) CYP3A4TRPA1ALDH1A1LMNATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0742244-B1 Durable polysulfide composition for optical material MITSUI CHEMICALS INC (JP) 2004-08-11 EP disclosed
CN-1146611-C Polythiol, process for producing same, sulfur-containing urethane-base resin prepared from polythiol, process for producing the resin, and lens ������ѹ��ѧ��ʽ���� 2004-04-21 CN disclosed
CN-1090654-C Resin composition based on polysulfide, resin based on polysulfide, and optical material containing said resin MITSUI TOATSU CHEMICALS K K (JP) 2002-09-11 CN disclosed
US-6100362-A COMPRISING A POLYTHIOL HAVING FOUR OR MORE FUNCTIONAL GROUPS AND AT LEAST ONE ISOCYANATE SELECTED FROM POLYISOCYANATE COMPOUNDS, POLYISOTHIOCYANATE COMPOUNDS AND ISOCYANATO GROUP-CONTAINING POLYISOTHIOCYANATE COMPOUNDS; LENSES MITSUI CHEMICALS, INC. (JP) 2000-08-08 US disclosed
US-5955206-A POLYTHIOETHERS AND ACRYLATE OR VINYL GROUPS FOR CURING TO FORM OPTICAL LENSES MITSUI CHEMICALS, INC. (JP) 1999-09-21 US disclosed
CN-1215737-A Polythiol, process for producing same, sulfur-containing urethane-base resin prepared from polythiol, process for producing the resin, and lens MITSUI TOATSU CHEMICALS (JP) 1999-05-05 CN disclosed
WO-1999020668-A1 HIGH REFRACTIVE INDEX OPHTHALMIC MATERIALS TECHNOLOGY RESOURCE INTERNATIONAL CORPORATION (US) 1999-04-29 WO disclosed
CN-1041917-C Polythiol, process for producing the same, sulfur-containing polyurethane-based resin obtained therefrom, process for producing the same, and lens MITSUI CHEMICALS INC (JP) 1999-02-03 CN disclosed
US-5837797-A CONDENSATION POLYMERIZING POLYTHIOL AND POLYISO(THIO)CYANATE MONOMERS TO MAKE POLYTHIOURETHANES AND POLYDITHIOCARBAMATES; REFRACTIVE INDEX, LIGHTWEIGHT, DYEABILITY, WEATHERPROOF, HEAT RESISTANCE, IMPACT STRENGTH MITSUI TOATSU CHEMICALS, INC. (JP) 1998-11-17 US disclosed
EP-0665219-B1 Polythiol, process for producing same, sulfur-containing urethane-base resin prepared from the polythiol, process for producing the resin, and lens MITSUI TOATSU CHEMICALS (JP) 1998-04-22 EP disclosed
CN-1154983-A Resin composition based on polysulfide, resin based on polysulfide, and optical material containing said resin MITSUI TOATSU CHEMICALS K K (JP) 1997-07-23 CN disclosed
US-5608115-A Polythiol useful for preparing sulfur-containing urethane-based resin and process for producing the same MITSUI TOATSU CHEMICALS, INC. (JP) 1997-03-04 US disclosed
EP-0742244-A2 Durable polysulfide composition for optical material MITSUI TOATSU CHEMICALS, INC. (JP) 1996-11-13 EP disclosed
CN-1111619-A Polythiol, process for producing the same, sulfur-containing polyurethane-based resin obtained therefrom, process for producing the same, and lens MITSUI TOATSU CHEMICALS (JP) 1995-11-15 CN disclosed
EP-0665219-A1 Polythiol, process for producing same, sulfur-containing urethane-base resin prepared from the polythiol, process for producing the resin, and lens MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1995-08-02 EP disclosed