SCHEMBL6907601

SCHEMBL6907601

Oc1c(Br)cc(-c2cccc3c2Cc2ccccc2-3)cc1Br

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PNMT P11086 1/20 0.46
CRHBP P24387 1/20 0.46
CRHR2 Q13324 1/20 0.46
NPC1 O15118 3/20 0.41
RAB9A P51151 3/20 0.41
HTR7 P34969 2/20 0.38
HTR2B P41595 2/20 0.38
SIRT2 Q8IXJ6 1/20 0.37
SIRT1 Q96EB6 1/20 0.37
LCK P06239 1/20 0.36
KDM4E B2RXH2 2/20 0.35
ALDH1A1 P00352 2/20 0.35
MAPT P10636 2/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
LMNA P02545 1/20 0.35
HPGD P15428 1/20 0.35
AKR1C1 Q04828 2/20 0.35
AKR1C4 P17516 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28276610 0.86 CRHBP (0.42) PNMTCRHBPCRHR2NPC1RAB9A
SCHEMBL17574464 0.84 PNMT (0.44) PNMTNPC1RAB9AHTR7HTR2B
SCHEMBL27759342 0.84 PNMT (0.46) PNMTNPC1RAB9AHTR7HTR2B
SCHEMBL27664689 0.83 PNMT (0.49) PNMTNPC1RAB9AHTR7HTR2B
SCHEMBL21295479 0.81 PNMT (0.50) PNMTNPC1RAB9AHTR7HTR2B
SCHEMBL3553779 0.81 PNMT (0.46) PNMTNPC1RAB9AHTR7HTR2B
SCHEMBL17574466 0.81 PNMT (0.46) PNMTNPC1RAB9AHTR7HTR2B
SCHEMBL5792235 0.81 PNMT (0.46) PNMTNPC1RAB9AHTR7HTR2B
SCHEMBL21632772 0.81 PNMT (0.46) PNMTNPC1RAB9AHTR7HTR2B
SCHEMBL27819054 0.81 PNMT (0.46) PNMTNPC1RAB9AHTR7HTR2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 156 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116144029-A Organosilicon leveling agent, preparation method thereof, black matrix photosensitive resin composition, color filter and liquid crystal display device 阜阳欣奕华材料科技有限公司 2023-05-23 CN claimed
CN-109634056-B Photosensitive resin composition and method for producing substrate with resin film 日铁化学材料株式会社 2024-07-09 CN disclosed
CN-118259550-A Photosensitive resin composition, cured film, color filter, touch panel, and display device 日铁化学材料株式会社 2024-06-28 CN disclosed
CN-117991589-A Photosensitive resin composition for black resist, light shielding film, color filter, touch panel, and display device 日铁化学材料株式会社 2024-05-07 CN disclosed
CN-117820197-A Oxime ester initiator, black matrix photosensitive resin composition containing oxime ester initiator and application of black matrix photosensitive resin composition 阜阳欣奕华材料科技有限公司 2024-04-05 CN disclosed
CN-108693704-B Photosensitive resin composition, light shielding film, liquid crystal display device, and method for manufacturing light shielding film and liquid crystal display device 日铁化学材料株式会社 2024-03-26 CN disclosed
CN-111221217-B Color material dispersion, photosensitive coloring resin composition, color filter, liquid crystal display device, and organic light-emitting display device DNP精细化工股份有限公司 2024-03-12 CN disclosed
CN-117510851-A Intrinsic black photosensitive resin, photosensitive resin composition, cured film, and color light-shielding layer 武汉柔显科技股份有限公司 2024-02-06 CN disclosed
CN-107463067-B Black photosensitive resin composition and application thereof 奇美实业股份有限公司 2024-01-26 CN disclosed
CN-117192898-A Photosensitive resin composition, cured film, display component, and display device 日铁化学材料株式会社 2023-12-08 CN disclosed
CN-102272908-A Resin paste for die bonding, process for producing semiconductor device using the resin paste, and semiconductor device 2011-12-07 CN disclosed
CN-101479312-B Resin composition comprising cardo resin, method for forming pattern using the resin composition and color filter using pattern formed by the method CHEIL IND INC 2011-07-20 CN disclosed
CN-101943863-A Photosensitive resin composition for black resist, and light shielding film of color filter NIPPON STEEL CHEMICAL CO 2011-01-12 CN disclosed
CN-101872121-A Photosensitive resin composition, cured film and partition wall NIPPON STEEL CHEMICAL CO 2010-10-27 CN disclosed
CN-101845137-A Alkaline water-soluble resin, its producing method and photosensitive resin composition using same NIPPON STEEL CHEMICAL CO 2010-09-29 CN disclosed
CN-101591423-A Alkali soluble resin and manufacture method thereof and the photosensitive polymer combination, cured article and the colour filter that have used alkali soluble resin NIPPON STEEL CHEMICAL CO (JP) 2009-12-02 CN disclosed
CN-101479312-A Resin composition comprising cardo resin, method for forming pattern using the resin composition and color filter using pattern formed by the method CHEIL IND INC (KR) 2009-07-08 CN disclosed
CN-101379111-A Polymerizable unsaturated compound and method for producing the same WAKO PURE CHEM IND LTD (JP) 2009-03-04 CN disclosed
US-6734279-B2 Two step production of polycarbonates GENERON IGS, INC. 2004-05-11 US disclosed
US-20030162653-A1 Two step production of polycarbonates GENERON IGS, INC. 2003-08-28 US disclosed