Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | ADORA3 | P0DMS8 | 7/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.34 |
| ▸ | TLR7 | Q9NYK1 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | MAPK8 | P45983 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4647349 | 0.96 | PTGS2 (0.35) | NPC1RAB9AADORA3KMT2AGAA | |
| SCHEMBL10880369 | 0.96 | PTGS2 (0.35) | NPC1RAB9AADORA3KMT2AGAA | |
| SCHEMBL14423818 | 0.93 | NPC1 (0.37) | NPC1RAB9AKMT2AGAAKDM4E | |
| SCHEMBL11454857 | 0.92 | NPC1 (0.38) | NPC1RAB9AADORA3KMT2AMEN1 | |
| SCHEMBL4207567 | 0.91 | NPC1 (0.36) | NPC1RAB9AKMT2AMEN1TLR8 | |
| SCHEMBL6834699 | 0.90 | CNR2 (0.32) | NPC1RAB9A | |
| Propionic Acid SCHEMBL6295773 | 0.90 | OXER1 (0.36) | KMT2AGAA | |
| SCHEMBL77250 | 0.89 | NPC1 (0.37) | NPC1RAB9AKMT2AMEN1GAA | |
| SCHEMBL30240899 | 0.89 | NPC1 (0.37) | NPC1RAB9AKMT2AMEN1GAA | |
| SCHEMBL29807700 | 0.89 | HSPA5 (0.43) | NPC1RAB9AKMT2AMEN1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-100390122-C | Composite stabilizer for improving stability of tetrabromoethane | TIANJING CHANGLUHAIJING GROUP (CN) | 2008-05-28 | — | — | CN | claimed |
| CN-1919811-A | Composite stabilizer for improving stability of tetrabromoethane | TIANJING CHANGLUHAIJING GROUP (CN) | 2007-02-28 | — | — | CN | claimed |
| CN-100390122-C | Composite stabilizer for improving stability of tetrabromoethane | TIANJING CHANGLUHAIJING GROUP (CN) | 2008-05-28 | — | — | CN | disclosed |
| CN-1919811-A | Composite stabilizer for improving stability of tetrabromoethane | TIANJING CHANGLUHAIJING GROUP (CN) | 2007-02-28 | — | — | CN | disclosed |
| US-20040039115-A1 | Polyethylene resin composition | MITSUI CHEMICALS, INC. (JP) | 2004-02-26 | — | — | US | disclosed |
| EP-1002833-B1 | Polyolefin-based resin compositions and fabricated products produced therefrom | MITSUI CHEMICALS INC (JP) | 2003-09-03 | — | — | EP | disclosed |
| US-6534579-B1 | Cyclic olefin resin and sorbitol derivative; heat resistance; transparent moldings | MITSUI CHEMICALS, INC. (JP) | 2003-03-18 | — | — | US | disclosed |
| EP-1081194-A1 | THERMOPLASTIC RESIN COMPOSITION AND USE THEREOF | Mitsui Chemicals, Inc. (JP) | 2001-03-07 | — | — | EP | disclosed |
| EP-1002833-A1 | Polyolefin-based resin compositions and fabricated products produced therefrom | Mitsui Chemicals, Inc. (JP) | 2000-05-24 | — | — | EP | disclosed |
| EP-0517506-B1 | Silver halide photographic product | KONISHIROKU PHOTO IND (JP) | 1999-03-17 | — | — | EP | disclosed |
| EP-0647880-B1 | Method of processing silver halide photographic light-sensitive material | KONISHIROKU PHOTO IND (JP) | 1999-03-03 | — | — | EP | disclosed |
| EP-0146302-A1 | Light-sensitive silver halide photographic material for direct-post and method for processing the same | KONICA CORPORATION (JP) | 1985-06-26 | — | — | EP | disclosed |
| US-4444875-A | LAYER OF A TETRAZOLIUM COMPOUND | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1984-04-24 | — | — | US | disclosed |
| US-4427764-A | DI-HIGHER ALKYL PHTHALATE | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1984-01-24 | — | — | US | disclosed |
| US-4268620-A | Method of processing of light-sensitive silver halide photographic material | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1981-05-19 | — | — | US | disclosed |
| US-4233400-A | HIGH CONTRAST IMAGE | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1980-11-11 | — | — | US | disclosed |
| US-4211835-A | TETRAZOLIUM COMPOUND, BLACK AND WHITE, HIGH CONTRAST | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1980-07-08 | — | — | US | disclosed |
| US-4210715-A | TETRAZOLIUM COMPOUND AND SENSITIZING DYE | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1980-07-01 | — | — | US | disclosed |
| US-4175966-A | NONDIFFUSING COMPOUND CAPABLE OF OXIDIZING HYDROQUINONE DEVELOPING AGENT | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1979-11-27 | — | — | US | disclosed |
| US-4169733-A | PRETREATMENT WITH NITROGEN HETEROCYCLE SUBSTITUTED WITH MERCAPTO, THIOKETONE OR THIOETHER GROUP OF SILVER HALIDE EMULSION CONTAINING A TETRAZOLIUM COMPOUND | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1979-10-02 | — | — | US | disclosed |