Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 | P23975 | 1/20 | 0.50 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.50 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | LTA4H | P09960 | 1/20 | 0.41 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.40 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.39 |
| ▸ | FDPS | P14324 | 1/20 | 0.39 |
| ▸ | KIF11 | P52732 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | PRMT1 | Q99873 | 1/20 | 0.38 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28202156 | 0.87 | TAAR1 (0.48) | SLC6A2TAAR1TP53CYP2D6LMNA | |
| SCHEMBL28927873 | 0.83 | SLC6A2 (0.41) | SLC6A2TAAR1TP53CYP2D6LMNA | |
| SCHEMBL8965114 | 0.80 | TP53 (0.40) | SLC6A2TAAR1TP53CYP2D6LMNA | |
| SCHEMBL4964541 | 0.80 | SLC6A2 (0.50) | SLC6A2TAAR1TP53CYP2D6LMNA | |
| SCHEMBL5088767 | 0.80 | SLC6A2 (0.50) | SLC6A2TAAR1TP53CYP2D6LMNA | |
| SCHEMBL10462120 | 0.78 | SLC6A2 (0.54) | SLC6A2TAAR1TP53CYP2D6LMNA | |
| Methane SCHEMBL27048839 | 0.78 | TAAR1 (0.48) | SLC6A2TAAR1TP53CYP2D6LMNA | |
| SCHEMBL872871 | 0.78 | SLC6A2 (0.54) | SLC6A2TAAR1TP53CYP2D6LMNA | |
| SCHEMBL25407758 | 0.76 | TAAR1 (0.58) | SLC6A2TAAR1TP53CYP2D6LMNA | |
| SCHEMBL9862386 | 0.76 | CYP1A2 (0.50) | SLC6A2TAAR1TP53CYP2D6LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114815507-A | Low-odor photosensitive resin composition for photosensitive dry film | 江西惠美兴科技有限公司 | 2022-07-29 | — | — | CN | claimed |
| CN-113741147-A | Photoresist with high resolution and excellent adhesion | 深圳惠美亚科技有限公司 | 2021-12-03 | — | — | CN | claimed |
| CN-117120925-A | Photosensitive laminate and method for manufacturing circuit board using the same | 可隆工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| CN-116981998-A | Photosensitive laminate and method for manufacturing circuit board using the same | 可隆工业株式会社 | 2023-10-31 | — | — | CN | disclosed |
| CN-116964527-A | Photosensitive laminate and method for manufacturing circuit board using the same | 可隆工业株式会社 | 2023-10-27 | — | — | CN | disclosed |
| CN-116783549-A | Photosensitive laminate, method of manufacturing photosensitive laminate, and method of manufacturing circuit board using the same | 可隆工业株式会社 | 2023-09-19 | — | — | CN | disclosed |
| CN-116745698-A | Photosensitive laminate, method for producing photosensitive laminate, and method for producing circuit board | 可隆工业株式会社 | 2023-09-12 | — | — | CN | disclosed |
| CN-116724273-A | Photosensitive laminate, method for producing photosensitive laminate, and method for producing circuit board | 可隆工业株式会社 | 2023-09-08 | — | — | CN | disclosed |
| CN-116547320-A | Photosensitive element, dry film photoresist, resist pattern, circuit board and display device using the same | 可隆工业株式会社 | 2023-08-04 | — | — | CN | disclosed |
| CN-115053182-A | Photosensitive resin composition, and dry film photoresist, photosensitive element, circuit board and display device using the same | 可隆工业株式会社 | 2022-09-13 | — | — | CN | disclosed |
| CN-114902133-A | Photosensitive resin layer, dry film photoresist using the same, and photosensitive element | 可隆工业株式会社 | 2022-08-12 | — | — | CN | disclosed |
| EP-1021426-B1 | CATALYTIC ASYMMETRIC EPOXIDATION | UNIV COLORADO STATE RES FOUND (US) | 2003-09-17 | — | — | EP | disclosed |
| US-20020133031-A1 | Catalytic asymmetric epoxidation | COLORADO STATE UNIVERSITY RESEARCH FOUNDATION (US) | 2002-09-19 | — | — | US | disclosed |
| US-6409769-B1 | ASYMMETRIC EPOXIDATION OF THE STEREOISOMERS WITH AN OXIDIZING AGENT AND A CHIRAL KETONE PRODUCING AN EPOXIDE OF AT LEAST ONE STEREOISOMER AT A RELATIVELY HIGHER RATE THAN AN EPOXIDE OF ANOTHER STEREOISOMER OF THE COMPOUND. | COLORADO STATE UNIVERSITY RESEARCH FOUNDATION | 2002-06-25 | — | — | US | disclosed |
| US-6348608-B1 | ADDING OXIDIZING AGENT TO REACTION SOLUTION COMPRISING CHIRAL CYCLIC ENANTIOMERICALLY ENRICHED KETONE AND OLEFIN UNDER CONDITIONS EFFECTIVE TO GENERATE ENANTIOMERICALLY ENRICHED EPOXIDE, SEPARATING EPOXIDE FROM REACTION SOLUTION | COLORADO STATE UNIVERSITY RESEARCH FOUNDATION | 2002-02-19 | — | — | US | disclosed |
| EP-0741332-B1 | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORP (JP) | 2000-08-09 | — | — | EP | disclosed |
| US-5924912-A | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1999-07-20 | — | — | US | disclosed |
| US-5916738-A | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1999-06-29 | — | — | US | disclosed |
| US-5756261-A | A CURABLE PHOTORESISTS BLENDS COMPRISING A POLYETHERURETHANE OR A POLYESTERURETHANE COPOLYMER WITH AN ACRYLIC COPOLYMER AND CARBOXY GROUP-CONTAINING CELLULOSE, A PHOTOINITIATOR; ADHESION, FLEXIBILITY, ELASTICITY | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1998-05-26 | — | — | US | disclosed |
| EP-0741332-A1 | Photosensitive resin composition for sandblast resist | MATSUSHITA ELECTRONICS CORPORATION (JP) | 1996-11-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020133031-A1 | Catalytic asymmetric epoxidation | CBR1, AOX1, CBR3 | SLC6A2 4865/4885TAAR1 1798/4885TP53 4869/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.