Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6910539

C[Zr](C)(=[SiH2])(C1C=Cc2ccccc21)C1C=Cc2ccccc21.O=S(=O)(O)C(F)(F)F

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL615610 1.00
Methyl Alcohol SCHEMBL7766797 0.83 HTR2A (0.33)
SCHEMBL1704957 0.83 HTR2A (0.35)
Hydrochloric Acid SCHEMBL271905 0.82 HTR2A (0.34)
SCHEMBL8754923 0.82 HTR2A (0.34)
Fluoride SCHEMBL7640655 0.82 HTR2A (0.34)
Bromide SCHEMBL6908313 0.82 HTR2A (0.34)
Hydrochloric Acid SCHEMBL8163839 0.82 HTR2A (0.34)
Hydrochloric Acid SCHEMBL7766826 0.80 HTR2A (0.33)
Dimethylamine SCHEMBL8357752 0.79 KDM4E (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0783022-B2 ETHYLENIC POLYMER COMPOSITION MITSUI CHEMICALS INC (JP) 2016-01-20 EP disclosed
EP-0783022-B1 ETHYLENIC POLYMER COMPOSITION MITSUI CHEMICALS INC (JP) 2004-09-22 EP disclosed
US-6063871-A SPECIFIC HIGH-DENSITY ETHYLENE POLYMER AND A SPECIFIC ETHYLENE POLYMER, IN WHICH AT LEAST ONE IS PREPARED USING A METALLOCENE CATALYST, AND THE DENSITY RATIO THEREBETWEEN EXCEEDS 1; MOLDABILITY, CRACK RESISTANCE, STRENGTH AND RIGIDITY MITSUI PETROCHEMICAL INDUSTRIES, INC. (JP) 2000-05-16 US disclosed
EP-0783022-A1 ETHYLENIC POLYMER COMPOSITION MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1997-07-09 EP disclosed