SCHEMBL6914923

SCHEMBL6914923

O=S(=O)([O-])c1ccccc1I.O=S(=O)([O-])c1ccccc1I.[Cd+2]

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.39
MEN1 O00255 1/20 0.39
RAD51 Q06609 1/20 0.38
PKLR P30613 3/20 0.36
GAA P10253 1/20 0.34
PTPN1 P18031 2/20 0.34
PGAM1 P18669 2/20 0.34
F2 P00734 2/20 0.34
PRSS1 P07477 2/20 0.34
PRSS2 P07478 2/20 0.34
PRSS3 P35030 2/20 0.34
HTR6 P50406 1/20 0.34
CA1 P00915 4/20 0.33
CA2 P00918 4/20 0.33
CA9 Q16790 3/20 0.33
CA4 P22748 3/20 0.33
CA6 P23280 2/20 0.33
CA12 O43570 2/20 0.33
MMP1 P03956 1/20 0.33
MMP2 P08253 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6917448 0.95 RAD51 (0.38) KMT2AMEN1RAD51PKLRGAA
SCHEMBL29566258 0.95 PKLR (0.40) KMT2AMEN1RAD51PKLRGAA
SCHEMBL6913789 0.95 RAD51 (0.38) KMT2AMEN1RAD51PKLRGAA
Zinc Ion SCHEMBL6915012 0.95 RAD51 (0.38) KMT2AMEN1RAD51PKLRGAA
SCHEMBL6915130 0.95 RAD51 (0.38) KMT2AMEN1RAD51PKLRGAA
Potassium Ion SCHEMBL15525174 0.95 RAD51 (0.42) KMT2AMEN1RAD51PKLRGAA
SCHEMBL6916722 0.95 RAD51 (0.38) KMT2AMEN1RAD51PKLRGAA
SCHEMBL3203465 0.95 PKLR (0.40) KMT2AMEN1RAD51PKLRGAA
SCHEMBL6915146 0.95 RAD51 (0.38) KMT2AMEN1RAD51PKLRGAA
SCHEMBL6913536 0.95 RAD51 (0.38) KMT2AMEN1RAD51PKLRGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6830704-B2 Contains a Lewis acid metal salt and a compound having clathrating ability. TOAGOSEI CO., LTD. (JP) 2004-12-14 US disclosed
US-20030135016-A1 Contains a Lewis acid metal salt and a compound having clathrating ability. TOAGOSEI CO., LTD. 2003-07-17 US disclosed
US-6547985-B1 Adhesive mixture TOGOSEI CO., LTD. (JP) 2003-04-15 US disclosed