SCHEMBL6916722

SCHEMBL6916722

O=S(=O)([O-])c1ccccc1I.O=S(=O)([O-])c1ccccc1I.O=S(=O)([O-])c1ccccc1I.[Ga+3]

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAD51 Q06609 1/20 0.38
PKLR P30613 3/20 0.36
GAA P10253 1/20 0.34
KMT2A Q03164 2/20 0.34
MEN1 O00255 1/20 0.34
PTPN1 P18031 3/20 0.34
PGAM1 P18669 2/20 0.34
HTR6 P50406 1/20 0.34
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
CA4 P22748 2/20 0.33
CA6 P23280 2/20 0.33
DUSP5 Q16690 1/20 0.33
CA12 O43570 1/20 0.33
CYP2C9 P11712 1/20 0.33
CA5A P35218 1/20 0.33
CA7 P43166 1/20 0.33
CA9 Q16790 1/20 0.33
CA14 Q9ULX7 1/20 0.33
CA5B Q9Y2D0 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6917448 0.95 RAD51 (0.38) RAD51PKLRGAAKMT2AMEN1
SCHEMBL29566258 0.95 PKLR (0.40) RAD51PKLRGAAKMT2AMEN1
Potassium Ion SCHEMBL15525174 0.95 RAD51 (0.42) RAD51PKLRGAAKMT2AMEN1
Zinc Ion SCHEMBL6915012 0.95 RAD51 (0.38) RAD51PKLRGAAKMT2AMEN1
SCHEMBL6915130 0.95 RAD51 (0.38) RAD51PKLRGAAKMT2AMEN1
SCHEMBL6914923 0.95 KMT2A (0.39) RAD51PKLRGAAKMT2AMEN1
SCHEMBL6913536 0.95 RAD51 (0.38) RAD51PKLRGAAKMT2AMEN1
SCHEMBL6913789 0.95 RAD51 (0.38) RAD51PKLRGAAKMT2AMEN1
SCHEMBL3203465 0.95 PKLR (0.40) RAD51PKLRGAAKMT2AMEN1
SCHEMBL6915146 0.95 RAD51 (0.38) RAD51PKLRGAAKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6830704-B2 Contains a Lewis acid metal salt and a compound having clathrating ability. TOAGOSEI CO., LTD. (JP) 2004-12-14 US disclosed
US-20030135016-A1 Contains a Lewis acid metal salt and a compound having clathrating ability. TOAGOSEI CO., LTD. 2003-07-17 US disclosed
US-6547985-B1 Adhesive mixture TOGOSEI CO., LTD. (JP) 2003-04-15 US disclosed