SCHEMBL6916799

SCHEMBL6916799

Cc1ccccc1SCc1ccccc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.61
MCHR1 Q99705 1/20 0.56
KMT2A Q03164 2/20 0.47
L3MBTL1 Q9Y468 2/20 0.47
SMN1; SMN2 Q16637 3/20 0.46
RAB9A P51151 3/20 0.46
MAPK1 P28482 3/20 0.46
LMNA P02545 3/20 0.46
MAPT P10636 2/20 0.46
TSHR P16473 2/20 0.46
NPC1 O15118 1/20 0.46
EGFR P00533 1/20 0.46
HPGD P15428 1/20 0.46
TDP1 Q9NUW8 1/20 0.46
S100A4 P26447 1/20 0.46
HSD17B10 Q99714 1/20 0.45
PTPRC P08575 1/20 0.43
MEN1 O00255 1/20 0.43
PKM P14618 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29700326 1.00 POLB (0.61) POLBMCHR1KMT2AL3MBTL1SMN1; SMN2
SCHEMBL11295153 0.84 MAPK1 (0.49) POLBMCHR1KMT2ASMN1; SMN2RAB9A
SCHEMBL30634086 0.83 POLB (0.52) POLBMCHR1KMT2AL3MBTL1SMN1; SMN2
SCHEMBL21048059 0.83 POLB (0.52) POLBMCHR1KMT2AL3MBTL1SMN1; SMN2
SCHEMBL13162356 0.81 HTT (0.54) MCHR1SMN1; SMN2RAB9ALMNAMAPT
SCHEMBL12603762 0.81 RAB9A (0.51) KMT2AL3MBTL1SMN1; SMN2RAB9AMAPK1
SCHEMBL12301179 0.81 MCHR1 (0.64) MCHR1KMT2ASMN1; SMN2RAB9AMAPT
SCHEMBL19821083 0.80 SMN1; SMN2 (0.51) POLBMCHR1KMT2AL3MBTL1SMN1; SMN2
SCHEMBL7445486 0.80 MAOB (0.56) L3MBTL1SMN1; SMN2RAB9ALMNAMAPT
SCHEMBL19869168 0.79 MCHR1 (0.45) POLBMCHR1KMT2AL3MBTL1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112521240-B Synthesis method of asymmetric thioether 扬州大学 2023-06-30 CN disclosed
US-6727294-B2 RADIATION TRANSPARENT MOLDING MATERIALS MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 2004-04-27 US disclosed
EP-0794218-B1 Polycarbonate resin composition stabilized against radiation MITSUBISHI ENG PLASTICS CORP (JP) 2003-10-15 EP disclosed
US-20010034419-A1 Radiation transparent molding materials MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 2001-10-25 US disclosed
US-6040367-A EXCELLENT RESISTANCE TO AN IONIZING RADIATION, IN WHICH HETEROCYCLIC COMPOUND CONTAINING OXYMETHYLENE UNITS MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 2000-03-21 US disclosed
US-5948838-A 0.01 TO 5 PARTS BY WEIGHT OF A COMPOUND CONTAINING OXYMETHYLENE UNIT MITSUBISHI ENGINEERING-PLASTICS CORP. (JP) 1999-09-07 US disclosed
EP-0694029-B1 NOVEL METHOD FOR PREPARING BETA-ALKOXY ACRYLIC ACID ROUSSEL UCLAF (FR) 1998-07-29 EP disclosed
US-5744635-A REACTING THE CORRESPONDING HALOGEN SUBSTITUTED COMPOUND WITH AN ORGANOMETALLIC COMPOUND Uclaf, Roussel (FR) 1998-04-28 US disclosed
EP-0794218-A2 Polycarbonate resin composition stabilized against radiation MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 1997-09-10 EP disclosed
EP-0694029-A1 NOVEL METHOD FOR PREPARING BETA-ALKOXY ACRYLIC ACID ROUSSEL UCLAF (FR) 1996-01-31 EP disclosed
WO-1994024085-A1 NOVEL METHOD FOR PREPARING β-ALKOXY ACRYLIC ACID ROUSSEL UCLAF (FR) 1994-10-27 WO disclosed