SCHEMBL692226

SCHEMBL692226

COc1ccccc1-c1nc2ccccc2c(=O)o1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
C1R P00736 6/20 1.00
ELANE P08246 3/20 0.72
CTSG P08311 4/20 0.65
KLK7 P49862 4/20 0.65
KLK14 Q9P0G3 4/20 0.65
KLK5 Q9Y337 4/20 0.65
PRSS1 P07477 2/20 0.65
ALDH1A1 P00352 4/20 0.65
KDM4E B2RXH2 3/20 0.65
HPGD P15428 3/20 0.65
NPC1 O15118 2/20 0.65
KMT2A Q03164 3/20 0.62
F2 P00734 2/20 0.62
PLG P00747 1/20 0.62
KLK1 P06870 1/20 0.62
C1S P09871 1/20 0.62
ATM Q13315 1/20 0.62
L3MBTL1 Q9Y468 1/20 0.62
LMNA P02545 1/20 0.62
MAPT P10636 1/20 0.62

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30366271 1.00 C1R (1.00) C1RELANECTSGKLK7KLK14
SCHEMBL17554130 0.88 C1R (0.78) C1RELANECTSGKLK7KLK14
SCHEMBL5793545 0.85 C1R (0.76) C1RELANECTSGKLK7KLK14
SCHEMBL5778141 0.85 C1R (0.73) C1RELANEPRSS1ALDH1A1KDM4E
SCHEMBL9475884 0.84 C1R (0.78) C1RELANEPRSS1ALDH1A1KDM4E
SCHEMBL29791056 0.84 C1R (0.78) C1RELANEPRSS1ALDH1A1KDM4E
SCHEMBL5790698 0.84 C1R (0.72) C1RELANECTSGKLK7KLK14
SCHEMBL9984612 0.84 ELANE (1.00) C1RELANECTSGKLK7KLK14
SCHEMBL913690 0.84 ELANE (0.74) C1RELANECTSGKLK7KLK14
SCHEMBL9475739 0.82 C1R (0.76) C1RELANEPRSS1ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 144 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025056330-A1 STABILIZED POLYMER COMPOSITIONS WITH IMPROVED COLOR RESISTANCE CYTEC INDUSTRIES INC. (US) 2025-03-20 WO claimed
EP-4363506-A1 COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT Cytec Industries Inc. (US) 2024-05-08 EP claimed
CN-117597403-A Composition and method for protecting a coating from harmful effects of exposure to UV-C light 塞特工业公司 2024-02-23 CN claimed
EP-4251689-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT Cytec Industries, Inc. (US) 2023-10-04 EP claimed
EP-4251690-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM THE DELETERIOUS EFFECTS EXPOSURE TO UV-C LIGHT Cytec Industries Inc. (US) 2023-10-04 EP claimed
CN-116783246-A Compositions and methods for protecting organic polymeric materials from discoloration due to exposure to UV-C light 塞特工业公司 2023-09-19 CN claimed
CN-116745353-A Compositions and methods for protecting organic polymeric materials from the deleterious effects of UV-C light exposure 塞特工业公司 2023-09-12 CN claimed
WO-2023278282-A1 COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2023-01-05 WO claimed
US-20220411646-A1 COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2022-12-29 US claimed
CN-115368629-A Stabilizer composition and method for protecting organic materials from UV light and thermal degradation using the same 塞特工业公司 2022-11-22 CN claimed
US-20220169829-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2022-06-02 US claimed
US-20220169828-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2022-06-02 US claimed
WO-2022115578-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM THE DELETERIOUS EFFECTS EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2022-06-02 WO claimed
WO-2022115573-A1 COMPOSITIONS AND METHODS FOR PROTECTING ORGANIC POLYMERIC MATERIALS FROM DISCOLORATION DUE TO EXPOSURE TO UV-C LIGHT CYTEC INDUSTRIES INC. (US) 2022-06-02 WO claimed
US-20210403690-A1 STABILIZER COMPOSITIONS AND METHODS FOR USING SAME FOR PROTECTING POLYMERIC ORGANIC MATERIALS FROM UV LIGHT AND THERMAL DEGRADATION CYTEC INDUSTRIES INC. (US) 2021-12-30 US claimed
US-11091615-B2 Stabilizer compositions and methods for using same for protecting organic materials from UV light and thermal degradation CYTEC INDUSTRIES INC. (US) 2021-08-17 US claimed
US-10975278-B2 Granular stabilizer compositions for use in polymer resins and methods of making same CYTEC INDUSTRIES INC. (US) 2021-04-13 US claimed
CN-112055728-A Particulate stabilizer composition for polymer resins and process for producing the same 塞特工业公司 2020-12-08 CN claimed
US-20190264084-A1 GRANULAR STABILIZER COMPOSITIONS FOR USE IN POLYMER RESINS AND METHODS OF MAKING SAME CYTEC INDUSTRIES INC. (US) 2019-08-29 US claimed
US-20160145427-A1 STABILIZER COMPOSITIONS AND METHODS FOR USING SAME FOR PROTECTING ORGANIC MATERIALS FROM UV LIGHT AND THERMAL DEGRADATION CYTEC INDUSTRIES INC. 2016-05-26 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220411646-A1 COMPOSITIONS AND METHODS FOR PROTECTING COATINGS FROM THE DELETERIOUS EFFECTS OF EXPOSURE TO UV-C LIGHT ERCC1, ERCC5, AAAS C1R 128/4885ELANE 2046/4885CTSG 1259/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.