SCHEMBL6928063

SCHEMBL6928063

C=C(C)C(=O)OCCC[Si](OC)(OCCCC)OCCCC

nearest known ligand 0.57

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.57
THRB P10828 1/20 0.42
ALDH1A1 P00352 3/20 0.41
TDP1 Q9NUW8 2/20 0.39
POLB P06746 1/20 0.39
APEX1 P27695 1/20 0.39
HTT P42858 1/20 0.39
HPGD P15428 1/20 0.37
ATM Q13315 1/20 0.35
L3MBTL1 Q9Y468 2/20 0.32
ACHE P22303 6/20 0.32
HCAR2 Q8TDS4 1/20 0.32
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25812321 0.97 TSHR (0.57) TSHRTHRBALDH1A1TDP1POLB
SCHEMBL17866568 0.93 TSHR (0.54) TSHRTHRBALDH1A1TDP1POLB
SCHEMBL11511750 0.93 TSHR (0.54) TSHRTHRBALDH1A1TDP1POLB
SCHEMBL72364 0.92 TSHR (0.62) TSHRTHRBALDH1A1TDP1POLB
SCHEMBL11510328 0.90 TSHR (0.54) TSHRTHRBALDH1A1TDP1POLB
SCHEMBL14122934 0.90 TSHR (0.54) TSHRTHRBALDH1A1TDP1POLB
SCHEMBL28333610 0.89 TSHR (0.67) TSHRTHRBALDH1A1TDP1POLB
SCHEMBL27521354 0.89 TSHR (0.67) TSHRTHRBALDH1A1TDP1POLB
SCHEMBL27709408 0.89 TSHR (0.67) TSHRTHRBALDH1A1TDP1POLB
SCHEMBL3417371 0.88 TSHR (0.51) TSHRTHRBALDH1A1TDP1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9617432-B2 Primer composition THE YOKOHAMA RUBBER CO., LTD. (JP) 2017-04-11 US disclosed
US-20160185975-A1 Primer Composition THE YOKOHAMA RUBBER CO., LTD. (JP) 2016-06-30 US disclosed
CN-105452394-A Primer composition YOKOHAMA RUBBER CO LTD 2016-03-30 CN disclosed
US-6518364-B2 Subjecting mixture of monomer(s), water, surfactant, free radical source and a control agent to polymerization SYMYX TECHNOLOGIES, INC. 2003-02-11 US disclosed