SCHEMBL6929609

SCHEMBL6929609

CCC(=O)OCC(O)COC(C)=O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.44
ALDH1A1 P00352 5/20 0.42
LMNA P02545 2/20 0.42
HSD17B10 Q99714 1/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
KDM4E B2RXH2 1/20 0.42
DUSP3 P51452 1/20 0.42
MAPT P10636 3/20 0.40
USP2 O75604 2/20 0.40
CYP3A4 P08684 2/20 0.40
LPAR1 Q92633 2/20 0.40
LPAR6 P43657 1/20 0.40
LPAR4 Q99677 1/20 0.40
LPAR5 Q9H1C0 1/20 0.40
LPAR2 Q9HBW0 1/20 0.40
LPAR3 Q9UBY5 1/20 0.40
HPGD P15428 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
ENPP2 Q13822 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13217090 0.94 MGAM (0.41) TDP1ALDH1A1LMNAHSD17B10MEN1
SCHEMBL9463770 0.91 KDM4E (0.47) ALDH1A1LMNAMEN1KMT2AKDM4E
SCHEMBL304203 0.86 TDP1 (0.54) TDP1ALDH1A1LMNAHSD17B10MEN1
SCHEMBL23049638 0.84 ALDH1A1 (0.44) TDP1ALDH1A1LMNAHSD17B10MAPT
SCHEMBL10799810 0.84 MEN1 (0.47) TDP1ALDH1A1LMNAMEN1KMT2A
SCHEMBL19768857 0.84 KDM4E (0.43) ALDH1A1LMNAMEN1KMT2AKDM4E
Propionic Acid SCHEMBL28172450 0.84 MEN1 (0.49) TDP1ALDH1A1LMNAHSD17B10MEN1
SCHEMBL13741499 0.83 KDM4E (0.51) ALDH1A1LMNAMEN1KMT2AKDM4E
SCHEMBL6058345 0.83 KDM4E (0.42) ALDH1A1LMNAMEN1KMT2AKDM4E
SCHEMBL14346367 0.83 NAAA (0.42) LMNAMEN1KMT2AKDM4EDUSP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230140810-A1 MATERIAL FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD FOR FORMING ADHESIVE FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 US disclosed
US-20100210809-A1 Polycarbonate And/Or Polyurethane Polyorganosiloxane Compounds MOMENTIVE PERFORMANCE MATERIALS GMBH (DE) 2010-08-19 US disclosed
US-7736822-B2 Resist underlayer coating forming composition for mask blank, mask blank and mask HOYA CORPORATION (JP) 2010-06-15 US disclosed
US-20100081081-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION FOR ELECTRON BEAM LITHOGRAPHY NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-04-01 US disclosed
EP-2090933-A1 Lithographic printing plate precursor and printing method FUJIFILM Corporation (JP) 2009-08-19 EP disclosed
US-20090197205-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PRINTING METHOD FUJIFILM CORPORATION (JP) 2009-08-06 US disclosed
US-20090197205-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PRINTING METHOD FUJIFILM CORPORATION (JP) 2009-08-06 US disclosed
US-7309560-B2 Composition for forming anti-reflective coating NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-12-18 US disclosed
US-20070190459-A1 Resist underlayer coating forming composition for mask blank, mask blank and mask HOYA CORPORATION (JP) 2007-08-16 US disclosed
EP-0846681-B1 NOVEL SULFONIUM SALT COMPOUNDS, POLYMERIZATION INITIATOR, CURABLE COMPOSITION, AND CURING METHOD NIPPON SODA CO (JP) 2003-12-03 EP disclosed
US-6093753-A CURABLE COMPOSITION COMPRISING A CATIONIC POLYMERIZABLE COMPOUND WHICH IS AN ALICYCLIC EPOXY COMPOUND OR A VINYL ETHER COMPOUND AND A CATIONIC POLYMERIZATION INITIATOR; PAINTS, ADHESIVES, INKS, PHOTORESISTS NIPPON SODA CO., LTD. (JP) 2000-07-25 US disclosed
EP-0846681-A1 NOVEL SULFONIUM SALT COMPOUNDS, POLYMERIZATION INITIATOR, CURABLE COMPOSITION, AND CURING METHOD NIPPON SODA CO., LTD. (JP) 1998-06-10 EP disclosed