SCHEMBL6929657

SCHEMBL6929657

Cc1ccc(NC(=O)C(Cl)(Cl)Cl)cc1C

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.59
HDAC1 Q13547 2/20 0.56
HDAC7 Q8WUI4 2/20 0.56
HDAC8 Q9BY41 2/20 0.56
HDAC6 Q9UBN7 2/20 0.56
KMT2A Q03164 5/20 0.51
MEN1 O00255 4/20 0.51
MAPT P10636 3/20 0.51
ALDH1A1 P00352 2/20 0.51
HPGD P15428 2/20 0.51
MAPK1 P28482 1/20 0.51
HTT P42858 1/20 0.51
NPC1 O15118 8/20 0.50
RAB9A P51151 8/20 0.50
GAA P10253 1/20 0.50
HDAC3 O15379 1/20 0.49
HDAC4 P56524 1/20 0.49
HDAC2 Q92769 1/20 0.49
HDAC10 Q969S8 1/20 0.49
HDAC11 Q96DB2 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22485482 0.86 KMT2A (0.49) POLBHDAC1HDAC7HDAC8HDAC6
SCHEMBL11170438 0.86 POLB (0.56) POLBHDAC1HDAC7HDAC8HDAC6
SCHEMBL14667344 0.83 L3MBTL1 (0.67) POLBHDAC1HDAC7HDAC8HDAC6
SCHEMBL11651027 0.79 KMT2A (0.44) HDAC1HDAC7HDAC8HDAC6KMT2A
SCHEMBL3012871 0.78 POLB (0.70) POLBHDAC1HDAC7HDAC8HDAC6
SCHEMBL14314465 0.77 POLB (0.59) POLBHDAC1HDAC7HDAC8HDAC6
SCHEMBL4822501 0.77 POLB (0.54) POLBHDAC1HDAC7HDAC8HDAC6
SCHEMBL21133077 0.76 HSD17B10 (0.62) KMT2AMEN1MAPTALDH1A1HPGD
SCHEMBL2336203 0.76 POLB (0.68) POLBHDAC1HDAC7HDAC8HDAC6
SCHEMBL29990241 0.76 POLB (0.68) POLBHDAC1HDAC7HDAC8HDAC6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0911153-B1 Image forming method KONISHIROKU PHOTO IND (JP) 2003-12-10 EP disclosed
US-6174646-B1 IMAGEWISE HEATING OR EXPOSING IMAGE FORMING MATERIAL TO LASER WHEREIN IMAGE FORMING MATERIAL COMPRISES SUPPORT HAVING RADIATION SENSITIVE LAYER CONTAINING DYE, AN ACID GENERATING COMPOUND CAPABLE OF GENERATING ACID ON IRRADIATION KONICA CORPORATION (JP) 2001-01-16 US disclosed
EP-0911153-A1 Image forming method KONICA CORPORATION (JP) 1999-04-28 EP disclosed