Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ENPEP | Q07075 | 1/20 | 0.32 |
| ▸ | CTH | P32929 | 1/20 | 0.31 |
| ▸ | CPA1 | P15085 | 1/20 | 0.31 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.31 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.31 |
| ▸ | BLM | P54132 | 1/20 | 0.31 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13101258 | 0.87 | — | — | |
| SCHEMBL13112957 | 0.82 | CTH (0.33) | CTHMEN1KMT2ALMNA | |
| SCHEMBL13112974 | 0.82 | TDP1 (0.41) | MEN1CYP2D6TSHRCYP2C19KMT2A | |
| SCHEMBL13101257 | 0.80 | GABRR1 (0.45) | ENPEPBLMTSHR | |
| SCHEMBL13101256 | 0.80 | TDP1 (0.33) | TSHRLMNA | |
| SCHEMBL5424436 | 0.77 | TDP1 (0.42) | MEN1CYP2D6TSHRCYP2C19KMT2A | |
| SCHEMBL9437667 | 0.76 | SLC6A2 (0.32) | SLC6A2SLC6A4BLMSLC6A3MEN1 | |
| SCHEMBL13112982 | 0.76 | — | — | |
| SCHEMBL9060209 | 0.73 | TSHR (0.56) | ENPEPTSHRLMNA | |
| Acrylic Acid SCHEMBL5500747 | 0.72 | LMNA (0.56) | MEN1TSHRKMT2ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6638683-B1 | Mixtures of polyhydroxystyrenes and/or copolymers, acid generators and solvents used for masking high resolution patterns on semiconductor integrated circuits, printed circuit or liquid crystal panels | FUJI PHOTO FILM CO., LTD. (JP) | 2003-10-28 | — | — | US | disclosed |
| EP-0887707-B1 | Positive photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 2003-09-03 | — | — | EP | disclosed |
| EP-0887707-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-12-30 | — | — | EP | disclosed |