SCHEMBL6933240

SCHEMBL6933240

CCC(O)c1ccc2cc(C(O)CC)ccc2c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.54
CYP2D6 P10635 4/20 0.50
CYP1A2 P05177 2/20 0.50
MEN1 O00255 2/20 0.50
KMT2A Q03164 2/20 0.50
TSHR P16473 2/20 0.50
AOC3 Q16853 1/20 0.50
HIF1A Q16665 1/20 0.50
UGT2B7 P16662 1/20 0.48
AKR1C3 P42330 5/20 0.43
AKR1C2 P52895 5/20 0.43
AKR1C1 Q04828 1/20 0.43
PTGS1 P23219 1/20 0.43
RAD52 P43351 1/20 0.42
ATM Q13315 1/20 0.41
CYP2C9 P11712 1/20 0.41
HSD17B10 Q99714 1/20 0.41
CYP3A4 P08684 2/20 0.40
SLC6A2 P23975 2/20 0.40
SLC6A4 P31645 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10120474 0.92 UGT2B7 (0.62) LMNACYP2D6CYP1A2MEN1KMT2A
SCHEMBL483715 0.92 UGT2B7 (0.62) LMNACYP2D6CYP1A2MEN1KMT2A
SCHEMBL13849487 0.88 LMNA (0.44) LMNACYP2D6CYP1A2MEN1KMT2A
SCHEMBL10382340 0.87 AKR1C3 (0.62) LMNACYP1A2TSHRAKR1C3AKR1C2
SCHEMBL15087422 0.87 AKR1C3 (0.62) LMNACYP1A2TSHRAKR1C3AKR1C2
SCHEMBL6045121 0.85 AOC3 (0.47) LMNACYP2D6CYP1A2MEN1KMT2A
SCHEMBL1607138 0.82 LMNA (0.75) LMNACYP2D6CYP1A2TSHRAOC3
SCHEMBL11595350 0.78 LMNA (0.70) LMNATSHRAOC3HIF1ASLC6A3
SCHEMBL22920980 0.77 TDP1 (0.64) LMNACYP2D6CYP1A2MEN1KMT2A
SCHEMBL29894151 0.77 TDP1 (0.64) LMNACYP2D6CYP1A2MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0911153-B1 Image forming method KONISHIROKU PHOTO IND (JP) 2003-12-10 EP disclosed
US-6174646-B1 IMAGEWISE HEATING OR EXPOSING IMAGE FORMING MATERIAL TO LASER WHEREIN IMAGE FORMING MATERIAL COMPRISES SUPPORT HAVING RADIATION SENSITIVE LAYER CONTAINING DYE, AN ACID GENERATING COMPOUND CAPABLE OF GENERATING ACID ON IRRADIATION KONICA CORPORATION (JP) 2001-01-16 US disclosed
EP-0911153-A1 Image forming method KONICA CORPORATION (JP) 1999-04-28 EP disclosed