SCHEMBL6933565

SCHEMBL6933565

O=C(N(Cl)c1ccccc1)C(Cl)(Cl)Oc1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
NPSR1 Q6W5P4 4/20 0.35
KMT2A Q03164 5/20 0.35
MEN1 O00255 4/20 0.35
CYP3A4 P08684 2/20 0.35
CYP2C19 P33261 2/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
CYP2C9 P11712 1/20 0.35
ALDH1A1 P00352 3/20 0.34
RAB9A P51151 3/20 0.34
HTT P42858 2/20 0.34
NPC1 O15118 2/20 0.34
POLB P06746 1/20 0.34
CYP1A2 P05177 2/20 0.33
ALOX15 P16050 1/20 0.32
PPARA Q07869 2/20 0.32
PPARG P37231 1/20 0.32
PTGES O14684 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7891308 0.76 NPSR1 (0.41) ATMTDP1L3MBTL1NPSR1KMT2A
SCHEMBL8584192 0.75 CYP1A2 (0.41) ATMTDP1L3MBTL1KMT2AMEN1
SCHEMBL692135 0.75 CYP1A2 (0.46) ATMTDP1L3MBTL1KMT2AMEN1
SCHEMBL8798649 0.74 NPSR1 (0.40) ATMTDP1L3MBTL1NPSR1KMT2A
SCHEMBL6933247 0.74 KMT2A (0.47) L3MBTL1NPSR1KMT2AMEN1CYP3A4
SCHEMBL28107544 0.74 CYP1A2 (0.45) ATMTDP1L3MBTL1KMT2AMEN1
Ammonia Solution, Strong SCHEMBL27869910 0.74 CYP1A2 (0.45) ATMTDP1L3MBTL1KMT2AMEN1
Water SCHEMBL28856009 0.74 CYP1A2 (0.45) ATMTDP1L3MBTL1KMT2AMEN1
Phosphine SCHEMBL27522539 0.74 CYP1A2 (0.45) ATMTDP1L3MBTL1KMT2AMEN1
SCHEMBL28219394 0.74 CYP1A2 (0.45) ATMTDP1L3MBTL1KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0911153-B1 Image forming method KONISHIROKU PHOTO IND (JP) 2003-12-10 EP disclosed
US-6174646-B1 IMAGEWISE HEATING OR EXPOSING IMAGE FORMING MATERIAL TO LASER WHEREIN IMAGE FORMING MATERIAL COMPRISES SUPPORT HAVING RADIATION SENSITIVE LAYER CONTAINING DYE, AN ACID GENERATING COMPOUND CAPABLE OF GENERATING ACID ON IRRADIATION KONICA CORPORATION (JP) 2001-01-16 US disclosed
EP-0911153-A1 Image forming method KONICA CORPORATION (JP) 1999-04-28 EP disclosed