SCHEMBL7891308

SCHEMBL7891308

O=C(N(Cl)c1ccccc1)C(F)(Cl)Cl

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 2/20 0.41
KMT2A Q03164 2/20 0.40
MEN1 O00255 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
CYP2C19 P33261 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
ALDH1A1 P00352 3/20 0.39
NPC1 O15118 1/20 0.39
POLB P06746 1/20 0.39
HTT P42858 1/20 0.39
RAB9A P51151 1/20 0.39
CES1 P23141 2/20 0.39
CYP1A2 P05177 1/20 0.39
ALOX15 P16050 1/20 0.37
L3MBTL1 Q9Y468 2/20 0.36
NR1H3 Q13133 2/20 0.36
MLYCD O95822 1/20 0.36
POLQ O75417 1/20 0.36
GLA P06280 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5533132 0.88 CES1 (0.43) NPSR1KMT2AMEN1CYP3A4CYP2C9
SCHEMBL8798649 0.82 NPSR1 (0.40) NPSR1KMT2AMEN1CYP3A4CYP2C9
SCHEMBL6933247 0.82 KMT2A (0.47) NPSR1KMT2AMEN1CYP3A4CYP2C9
SCHEMBL6928667 0.77 KMT2A (0.43) NPSR1KMT2AMEN1CYP3A4CYP2C9
SCHEMBL6933565 0.76 ATM (0.41) NPSR1KMT2AMEN1CYP3A4CYP2C9
SCHEMBL11115139 0.75 NPSR1 (0.56) NPSR1KMT2AMEN1CYP3A4CYP2C9
SCHEMBL3730131 0.75 NPSR1 (0.50) NPSR1KMT2AMEN1CYP3A4CYP2C9
SCHEMBL28809670 0.75 NPSR1 (0.38) NPSR1KMT2AMEN1CYP3A4CYP2C9
SCHEMBL6932838 0.74 ALDH1A1 (0.43) NPSR1KMT2AMEN1CYP3A4CYP2C9
SCHEMBL5932378 0.73 NPSR1 (0.48) NPSR1KMT2AMEN1CYP3A4CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6174646-B1 IMAGEWISE HEATING OR EXPOSING IMAGE FORMING MATERIAL TO LASER WHEREIN IMAGE FORMING MATERIAL COMPRISES SUPPORT HAVING RADIATION SENSITIVE LAYER CONTAINING DYE, AN ACID GENERATING COMPOUND CAPABLE OF GENERATING ACID ON IRRADIATION KONICA CORPORATION (JP) 2001-01-16 US disclosed
EP-0911153-A1 Image forming method KONICA CORPORATION (JP) 1999-04-28 EP disclosed