SCHEMBL6933934

SCHEMBL6933934

C=CCC(=C)c1ccccc1C#N

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.38
TSHR P16473 4/20 0.36
KDM4E B2RXH2 4/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
ESR2 Q92731 1/20 0.34
ALDH1A1 P00352 3/20 0.34
HPGD P15428 3/20 0.34
GLA P06280 1/20 0.34
GAA P10253 1/20 0.34
RCE1 Q9Y256 1/20 0.34
HSD17B10 Q99714 2/20 0.33
PPIA P62937 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
MAPT P10636 1/20 0.33
POLB P06746 2/20 0.33
HTT P42858 1/20 0.33
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9678327 0.82 CYP3A4 (0.47) CYP3A4TSHRKDM4EL3MBTL1ALDH1A1
SCHEMBL18192044 0.79 TSHR (0.42) TSHRKDM4EL3MBTL1ESR2ALDH1A1
SCHEMBL11877898 0.76 GABRA1 (0.44) CYP3A4TSHRKDM4EL3MBTL1ALDH1A1
SCHEMBL5712800 0.75 CYP3A4 (0.70) CYP3A4TSHRKDM4EL3MBTL1ALDH1A1
SCHEMBL27631598 0.75 ALDH1A1 (0.39) KDM4EL3MBTL1ALDH1A1HPGDGLA
SCHEMBL1079613 0.75 CYP3A4 (0.41) CYP3A4TSHRKDM4EL3MBTL1CA1
SCHEMBL17868845 0.73 CYP3A4 (0.40) CYP3A4TSHRKDM4EALDH1A1HPGD
SCHEMBL1493085 0.73 CYP3A4 (0.40) CYP3A4TSHRKDM4EALDH1A1HPGD
SCHEMBL17868852 0.73 HPGD (0.50) CYP3A4TSHRKDM4EALDH1A1HPGD
SCHEMBL17868849 0.73 CYP3A4 (0.40) CYP3A4TSHRKDM4EALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6767687-B1 CAN FORM FINER PATTERNS ON A SUBSTRATE IN A MICRO-LITHOGRAPHY PROCESS SUITABLE FOR MICRO-PROCESSING OF SEMICONDUCTORS DONGJIN SEMICHEM CO., LTD. (KR) 2004-07-27 US disclosed
US-6743881-B2 HIGH RESOLUTION MICROLITHOGRAPHY; POST EXPOSURE DELAY STABILITY; HEAT RESISTANCE; TERPOLYMER CONTAINING STYRENIC, P-VINYLPHENOL AND VINYLBENZENE CONTAINING BRANCHED ESTER SUBSTITUTION DONGJIN SEMICHEM CO., LTD. (KR) 2004-06-01 US disclosed
US-20030181629-A1 Chemically amplified resist and a resist composition DONGJIN SEMICHEM CO., LTD. (KR) 2003-09-25 US disclosed
WO-2001079934-A1 CHEMICALLY AMPLIFIED RESIST AND A RESIST COMPOSITION DONGJIN SEMICHEM CO., LTD. (KR) 2001-10-25 WO disclosed
WO-2001018603-A2 POLYMER FOR CHEMICALLY AMPLIFIED RESIST AND A RESIST COMPOSITION USING THE SAME DONGJIN SEMICHEM CO., LTD. (KR) 2001-03-15 WO disclosed