SCHEMBL6934071

SCHEMBL6934071

CCCCCCCCCCCCc1ccc(-c2c(C)cc(C)cc2C)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RARB P10826 7/20 0.52
HSD17B10 Q99714 3/20 0.50
ALDH1A1 P00352 3/20 0.50
ESR1 P03372 2/20 0.50
ADRA2A P08913 2/20 0.50
ADORA3 P0DMS8 2/20 0.50
TACR2 P21452 2/20 0.50
SLC6A2 P23975 2/20 0.50
SLC6A4 P31645 2/20 0.50
SLC6A3 Q01959 2/20 0.50
KDM4E B2RXH2 2/20 0.50
PTGS2 P35354 2/20 0.50
LMNA P02545 1/20 0.50
SHBG P04278 1/20 0.50
TP53 P04637 1/20 0.50
CYP3A4 P08684 1/20 0.50
HSPD1 P10809 1/20 0.50
ADRB3 P13945 1/20 0.50
HTR2C P28335 1/20 0.50
HSPE1 P61604 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16769412 0.91 ALDH1A1 (0.50) RARBHSD17B10ALDH1A1ESR1ADRA2A
SCHEMBL16769417 0.90 ALDH1A1 (0.49) RARBHSD17B10ALDH1A1ESR1ADRA2A
SCHEMBL10042906 0.85 SKP2 (0.42) RARBCYP3A4HPGDRAB9AHSD11B1
SCHEMBL16769415 0.85 MEN1 (0.45) RARBHSD17B10ALDH1A1KDM4ETSHR
SCHEMBL20108348 0.85 HRH1 (0.44) RARBHTR2A
SCHEMBL16769422 0.84 MEN1 (0.43) RARBHSD17B10ALDH1A1KDM4EPTGS2
SCHEMBL16769420 0.81 MAPT (0.53) RARBHSD17B10ALDH1A1KDM4EMEN1
SCHEMBL15313781 0.80 ESR1 (0.51) RARBHSD17B10ALDH1A1ESR1ADRA2A
SCHEMBL30577318 0.80 HSD17B10 (0.62) RARBHSD17B10ALDH1A1ESR1ADRA2A
SCHEMBL28385904 0.80 HSD17B10 (0.62) RARBHSD17B10ALDH1A1ESR1ADRA2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6528229-B2 Mixture of polymer and acid generators FUJI PHOTO FILM CO., LTD. (JP) 2003-03-04 US disclosed
US-20010041303-A1 Positive photoresist composition FUJIFILM CORPORATION (JP) 2001-11-15 US disclosed