⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Urea SCHEMBL26917012 | 0.87 | KEAP1 (0.31) | — | |
| SCHEMBL295228 | 0.71 | — | — | |
| SCHEMBL7797313 | 0.71 | — | — | |
| SCHEMBL31531926 | 0.71 | — | — | |
| SCHEMBL8522934 | 0.71 | — | — | |
| SCHEMBL10535550 | 0.65 | — | — | |
| SCHEMBL10535537 | 0.65 | — | — | |
| SCHEMBL27624703 | 0.64 | ALDH1A1 (0.32) | — | |
| SCHEMBL5847378 | 0.63 | — | — | |
| SCHEMBL8190721 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107589633-A | Resist lower floor membrane material, pattern formation method, resist lower membrane forming method and resist lower floor membrane material compound | 信越化学工业株式会社 | 2018-01-16 | — | — | CN | disclosed |
| US-6611367-B1 | Dielectric block, silver film, photo-functional film with change in refractive index upon light exposure, and oxygen cut film | FUJI PHOTO FILM CO., LTD. (JP) | 2003-08-26 | — | — | US | disclosed |
| EP-0217245-B1 | OPTICAL DATA STORAGE MEDIUM BASED ON METHINE DYES AND ANIONIC METHINE DYES | BASF Aktiengesellschaft (DE) | 1992-01-02 | — | — | EP | disclosed |