Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.40 |
| ▸ | PKM | P14618 | 2/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30716703 | 1.00 | KDM4E (0.43) | KDM4EALDH1A1PKMTDP1LMNA | |
| SCHEMBL6355414 | 0.84 | KDM4E (0.42) | KDM4EALDH1A1PKMTDP1LMNA | |
| SCHEMBL12943492 | 0.83 | KDM4E (0.42) | KDM4EALDH1A1PKMTDP1LMNA | |
| SCHEMBL3649759 | 0.82 | KDM4E (0.40) | KDM4EALDH1A1PKMTDP1LMNA | |
| SCHEMBL3645416 | 0.82 | KDM4E (0.40) | KDM4EALDH1A1PKMTDP1LMNA | |
| SCHEMBL7072785 | 0.81 | KDM4E (0.38) | KDM4EALDH1A1PKMTDP1LMNA | |
| SCHEMBL12943494 | 0.80 | KDM4E (0.40) | KDM4EALDH1A1PKMTDP1LMNA | |
| SCHEMBL6351927 | 0.80 | KDM4E (0.45) | KDM4EALDH1A1PKMTDP1LMNA | |
| SCHEMBL13595432 | 0.79 | KDM4E (0.36) | KDM4EALDH1A1PKMTDP1LMNA | |
| SCHEMBL775569 | 0.78 | KDM4E (0.35) | KDM4EALDH1A1PKMTDP1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6420503-B1 | POLYCARBONS/OTHER/ | SUMITOMO BAKELITE CO. LTD. (JP) | 2002-07-16 | — | — | US | claimed |
| CN-117406550-A | High-resolution negative photoresist and preparation method and application thereof | 江苏艾森半导体材料股份有限公司 | 2024-01-16 | — | — | CN | disclosed |
| CN-111999983-A | Negative high-resolution photoresist | 邵杰 | 2020-11-27 | — | — | CN | disclosed |
| CN-111999983-A | Negative high-resolution photoresist | 邵杰 | 2020-11-27 | — | — | CN | disclosed |
| US-9291893-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-22 | — | — | US | disclosed |
| WO-2011002516-A2 | A SELF-IMAGEABLE FILM FORMING POLYMER, COMPOSITIONS THEREOF AND DEVICES AND STRUCTURES MADE THEREFROM | PROMERUS LLC (US) | 2011-01-06 | — | — | WO | disclosed |
| US-7550630-B2 | Process for producing N-(bicyclo[2.2.1]hept-5-en-2-ylmethyl)-1,1,1-trifluoromethanesulfonamide | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-06-23 | — | — | US | disclosed |
| US-7241553-B2 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-07-10 | — | — | US | disclosed |
| US-7241553-B2 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-07-10 | — | — | US | disclosed |
| US-6649714-B2 | Metathesis ring opening polymerization of cyclic nonaromatic monomers, in the presence of polymerization catalysts, then hydrogenating without additional hydrogenation catalysts; efficiency | SUMITOMO BAKELITE CO., LTD. (JP) | 2003-11-18 | — | — | US | disclosed |
| US-6528598-B1 | E Ni(C6F5)2 and E represents a neutral electron donor; (toluene)bis(perfluorophenyl) nickel; | SUMITOMO BAKELITE CO., LTD. (JP) | 2003-03-04 | — | — | US | disclosed |
| US-6525153-B1 | Photoresists; sensitizing photoacid initiator to longer wavelengths photolithography | SUMITOMO BAKELITE CO., LTD. (JP) | 2003-02-25 | — | — | US | disclosed |
| US-6420503-B1 | POLYCARBONS/OTHER/ | SUMITOMO BAKELITE CO. LTD. (JP) | 2002-07-16 | — | — | US | disclosed |
| EP-1163282-A1 | PROCESSES FOR MAKING POLYMERS CONTAINING PENDANT CYCLIC ANHYDRIDE GROUPS | The B.F. Goodrich Company (US) | 2001-12-19 | — | — | EP | disclosed |
| EP-1157058-A1 | METHOD OF PREPARING NORBORNENE SULFONAMIDE POLYMERS | The B.F. Goodrich Company (US) | 2001-11-28 | — | — | EP | disclosed |
| US-6235849-B1 | INCLUDE COPOLYMERS WITH ONE OR MORE COMONOMERS SUCH AS NORBORNENE, ETHYLENE, AN ACRYLATE OR SULFUR DIOXIDE OR CARBON MONOXIDE; ALSO RING-OPENING METATHESIS POLYMERIZATION; GROUP VIII METAL COMPOUND CATALYST | THE B. F. GOODRICH COMPANY | 2001-05-22 | — | — | US | disclosed |
| WO-2000053657-A1 | PROCESSES FOR MAKING POLYMERS CONTAINING PENDANT CYCLIC ANHYDRIDE GROUPS | THE B.F. GOODRICH COMPANY (US) | 2000-09-14 | — | — | WO | disclosed |
| WO-2000053658-A1 | POLYCYCLIC POLYMERS CONTAINING PENDANT CYCLIC ANHYDRIDE GROUPS | THE B.F. GOODRICH COMPANY (US) | 2000-09-14 | — | — | WO | disclosed |
| WO-2000046268-A1 | NORBORNENE SULFONAMIDE POLYMERS | THE B.F. GOODRICH COMPANY (US) | 2000-08-10 | — | — | WO | disclosed |
| WO-2000046267-A1 | METHOD OF PREPARING NORBORNENE SULFONAMIDE POLYMERS | THE B.F. GOODRICH COMPANY (US) | 2000-08-10 | — | — | WO | disclosed |