Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 8/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | PKM | P14618 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2632934 | 0.91 | KDM4E (0.34) | KDM4EALDH1A1PKMMEN1CYP1A2 | |
| SCHEMBL2632935 | 0.85 | CA1 (0.34) | KDM4EALDH1A1PKMMEN1CYP1A2 | |
| SCHEMBL775863 | 0.84 | EPHX1 (0.36) | KDM4EALDH1A1PKMMEN1CYP1A2 | |
| SCHEMBL8531194 | 0.82 | EPHX1 (0.41) | KDM4EALDH1A1PKMMEN1CYP1A2 | |
| SCHEMBL13595432 | 0.79 | KDM4E (0.36) | KDM4EALDH1A1PKMTDP1LMNA | |
| SCHEMBL3645416 | 0.78 | KDM4E (0.40) | KDM4EALDH1A1PKMTDP1LMNA | |
| SCHEMBL3649759 | 0.78 | KDM4E (0.40) | KDM4EALDH1A1PKMTDP1LMNA | |
| SCHEMBL6935344 | 0.78 | KDM4E (0.43) | KDM4EALDH1A1PKMMEN1KMT2A | |
| SCHEMBL6355414 | 0.77 | KDM4E (0.42) | KDM4EALDH1A1PKMMEN1KMT2A | |
| SCHEMBL13237669 | 0.75 | KDM4E (0.34) | KDM4EALDH1A1PKMMEN1CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 152 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10591818-B2 | Nadic anhydride polymers and photosensitive compositions derived therefrom | PROMERUS, LLC (US) | 2020-03-17 | — | — | US | claimed |
| US-20180030189-A1 | NADIC ANHYDRIDE POLYMERS AND PHOTOSENSITIVE COMPOSITIONS DERIVED THEREFROM | PROMERUS, LLC (US) | 2018-02-01 | — | — | US | claimed |
| US-8753790-B2 | Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom | PROMERUS, LLC (US) | 2014-06-17 | — | — | US | claimed |
| US-7550630-B2 | Process for producing N-(bicyclo[2.2.1]hept-5-en-2-ylmethyl)-1,1,1-trifluoromethanesulfonamide | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-06-23 | — | — | US | claimed |
| US-20080071113-A1 | Process for producing n-(bicyclo[2.2.1]hept-5-en-2-ylmethyl)-1,1,1-trifluoromethanesulfonamide | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-03-20 | — | — | US | claimed |
| US-10591818-B2 | Nadic anhydride polymers and photosensitive compositions derived therefrom | PROMERUS, LLC (US) | 2020-03-17 | — | — | US | disclosed |
| WO-2018022952-A1 | NADIC ANHYDRIDE POLYMERS AND PHOTOSENSITIVE COMPOSITIONS DERIVED THEREFROM | PROMERUS, LLC (US) | 2018-02-01 | — | — | WO | disclosed |
| WO-2018022952-A1 | NADIC ANHYDRIDE POLYMERS AND PHOTOSENSITIVE COMPOSITIONS DERIVED THEREFROM | PROMERUS, LLC (US) | 2018-02-01 | — | — | WO | disclosed |
| US-20180030189-A1 | NADIC ANHYDRIDE POLYMERS AND PHOTOSENSITIVE COMPOSITIONS DERIVED THEREFROM | PROMERUS, LLC (US) | 2018-02-01 | — | — | US | disclosed |
| US-20180030189-A1 | NADIC ANHYDRIDE POLYMERS AND PHOTOSENSITIVE COMPOSITIONS DERIVED THEREFROM | PROMERUS, LLC (US) | 2018-02-01 | — | — | US | disclosed |
| US-9671693-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| US-9671693-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| US-7189490-B2 | Photoresists containing sulfonamide component | SHIPLEY COMPANY, L.L.C. (US) | 2007-03-13 | — | — | US | disclosed |
| US-7189490-B2 | Photoresists containing sulfonamide component | SHIPLEY COMPANY, L.L.C. (US) | 2007-03-13 | — | — | US | disclosed |
| EP-1157058-B1 | METHOD OF PREPARING NORBORNENE SULFONAMIDE POLYMERS | SUMITOMO BAKELITE CO (JP) | 2003-06-25 | — | — | EP | disclosed |
| US-6420503-B1 | POLYCARBONS/OTHER/ | SUMITOMO BAKELITE CO. LTD. (JP) | 2002-07-16 | — | — | US | disclosed |
| EP-1157058-A1 | METHOD OF PREPARING NORBORNENE SULFONAMIDE POLYMERS | The B.F. Goodrich Company (US) | 2001-11-28 | — | — | EP | disclosed |
| US-6235849-B1 | INCLUDE COPOLYMERS WITH ONE OR MORE COMONOMERS SUCH AS NORBORNENE, ETHYLENE, AN ACRYLATE OR SULFUR DIOXIDE OR CARBON MONOXIDE; ALSO RING-OPENING METATHESIS POLYMERIZATION; GROUP VIII METAL COMPOUND CATALYST | THE B. F. GOODRICH COMPANY | 2001-05-22 | — | — | US | disclosed |
| WO-2000046267-A1 | METHOD OF PREPARING NORBORNENE SULFONAMIDE POLYMERS | THE B.F. GOODRICH COMPANY (US) | 2000-08-10 | — | — | WO | disclosed |
| WO-2000046268-A1 | NORBORNENE SULFONAMIDE POLYMERS | THE B.F. GOODRICH COMPANY (US) | 2000-08-10 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080071113-A1 | Process for producing n-(bicyclo[2.2.1]hept-5-en-2-ylmethyl)-1,1,1-trifluoromethanesulfonamide | HCN1, HCN2, KCNMA1 | KDM4E 944/4885ALDH1A1 805/4885PKM 247/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.