Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA9 | Q16790 | 5/20 | 0.45 |
| ▸ | CA1 | P00915 | 4/20 | 0.45 |
| ▸ | CA12 | O43570 | 3/20 | 0.45 |
| ▸ | CA2 | P00918 | 3/20 | 0.41 |
| ▸ | ESR1 | P03372 | 3/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.39 |
| ▸ | NFKB2 | Q00653 | 2/20 | 0.39 |
| ▸ | RELA | Q04206 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.39 |
| ▸ | CASP3 | P42574 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.39 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.39 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.39 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.37 |
| ▸ | ERCC1 | P07992 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10053400 | 0.82 | ALDH1A1 (0.52) | CA9CA1CA12CA2ALDH1A1 | |
| SCHEMBL28901166 | 0.82 | MAPK1 (0.57) | CA9CA1CA12CA2ALDH1A1 | |
| SCHEMBL12534812 | 0.82 | POLB (0.49) | ALDH1A1KDM4EPOLBHTTKMT2A | |
| SCHEMBL12540883 | 0.78 | NPC1 (0.41) | CA9CA1CA12CA2ALDH1A1 | |
| SCHEMBL3822609 | 0.78 | ESR1 (0.39) | CA9CA1CA12CA2ESR1 | |
| SCHEMBL12541257 | 0.78 | CA9 (0.43) | CA9CA1CA12CA2ESR1 | |
| SCHEMBL31411903 | 0.74 | CA9 (0.53) | CA9CA1CA12CA2ALDH1A1 | |
| SCHEMBL3279383 | 0.74 | CA9 (0.53) | CA9CA1CA12CA2ALDH1A1 | |
| SCHEMBL12565089 | 0.73 | ALDH1A1 (0.42) | CA9CA1CA12CA2ALDH1A1 | |
| SCHEMBL25060901 | 0.73 | KDM4E (0.57) | ESR1ALDH1A1NFKB1NFKB2RELA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6582879-B2 | Specified photo acid generating agent used in heat resistant photoresist composition which contains polyamide oligomer containing ester groups as pendant groups; minimize post-exposure baking process and post-exposure delay effect | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 2003-06-24 | — | — | US | disclosed |
| US-20030064315-A1 | Reactive photo acid-generating agent and heat-resistant photoresist composition with polyamide precursor | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY | 2003-04-03 | — | — | US | disclosed |