SCHEMBL6940691

SCHEMBL6940691

C=Cc1ccc(Cn2ccnc2)cc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP11B1 P15538 10/20 0.64
CYP11B2 P19099 9/20 0.64
CYP19A1 P11511 6/20 0.64
CYP2A6 P11509 1/20 0.64
CYP2B6 P20813 1/20 0.64
TBXAS1 P24557 5/20 0.61
CYP1A2 P05177 3/20 0.61
CYP3A4 P08684 2/20 0.61
CYP2D6 P10635 2/20 0.61
POLB P06746 1/20 0.61
MAPT P10636 1/20 0.61
QPCT Q16769 1/20 0.61
CYP4Z1 Q86W10 1/20 0.61
QPCTL Q9NXS2 1/20 0.61
USP2 O75604 1/20 0.60
LMNA P02545 1/20 0.60
MEN1 O00255 1/20 0.60
CYP2C19 P33261 1/20 0.60
KMT2A Q03164 1/20 0.60
CYP17A1 P05093 1/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL28482452 0.98 CYP11B1 (0.62) CYP11B1CYP11B2CYP19A1CYP2A6CYP2B6
SCHEMBL1024261 0.85 CYP11B1 (0.84) CYP11B1CYP11B2CYP19A1CYP2A6CYP2B6
SCHEMBL210793 0.84 CYP11B1 (0.69) CYP11B1CYP11B2CYP19A1CYP2A6CYP2B6
SCHEMBL28726317 0.83 TBXAS1 (0.56) CYP11B1CYP11B2CYP19A1CYP2A6CYP2B6
SCHEMBL9401817 0.83 TBXAS1 (0.65) CYP11B1CYP11B2CYP19A1CYP2A6CYP2B6
SCHEMBL9401491 0.83 TBXAS1 (0.65) CYP11B1CYP11B2CYP19A1CYP2A6CYP2B6
SCHEMBL7301039 0.83 TBXAS1 (0.65) CYP11B1CYP11B2CYP19A1CYP2A6CYP2B6
Hydrochloric Acid SCHEMBL1775141 0.83 CYP11B1 (0.81) CYP11B1CYP11B2CYP19A1CYP2A6CYP2B6
Hydrochloric Acid SCHEMBL28375539 0.82 TBXAS1 (0.58) CYP19A1TBXAS1KMT2A
SCHEMBL23301137 0.81 CYP19A1 (0.66) CYP19A1TBXAS1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119979016-A High-toughness delayed-curing UV adhesive based on biomass oil and preparation method thereof 鲁东大学 2025-05-13 CN claimed
CN-115368518-B Colloidal particle emulsifier and preparation method and application thereof 西南石油大学 2025-05-02 CN claimed
WO-2024106832-A1 PHOTORESIST COMPOSITION FOR EUV, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING PHOTORESIST PATTERN USING SAME 광주과학기술원 2024-05-23 WO claimed
CN-116948562-A Multifunctional lithium-sulfur battery positive electrode adhesive and preparation method thereof 浙江工业大学 2023-10-27 CN claimed
CN-115722061-A Antimony ingot production waste gas treatment system 贵州华星冶金有限公司 2023-03-03 CN claimed
CN-115368518-A Colloidal particle emulsifier and preparation method and application thereof 西南石油大学 2022-11-22 CN claimed
CN-114702622-B Thixotropic self-healing gel plugging agent and preparation method and application thereof 承德石油高等专科学校 2022-10-21 CN claimed
CN-114702622-A Thixotropic self-healing gel plugging agent and preparation method and application thereof 承德石油高等专科学校 2022-07-05 CN claimed
CN-110699020-B Use of polyion liquid as adhesive 湖南大学 2020-12-18 CN claimed
CN-110699020-A Polyion liquid adhesive and preparation method thereof 湖南大学 2020-01-17 CN claimed
CN-119979016-A High-toughness delayed-curing UV adhesive based on biomass oil and preparation method thereof 鲁东大学 2025-05-13 CN disclosed
CN-115368518-B Colloidal particle emulsifier and preparation method and application thereof 西南石油大学 2025-05-02 CN disclosed
WO-2024106832-A1 PHOTORESIST COMPOSITION FOR EUV, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING PHOTORESIST PATTERN USING SAME 광주과학기술원 2024-05-23 WO disclosed
CN-116948562-A Multifunctional lithium-sulfur battery positive electrode adhesive and preparation method thereof 浙江工业大学 2023-10-27 CN disclosed
CN-115722061-A Antimony ingot production waste gas treatment system 贵州华星冶金有限公司 2023-03-03 CN disclosed
EP-1288338-A1 Process for inhibiting metallic corrosion in aqueous systems ROHM AND HAAS COMPANY (US) 2003-03-05 EP disclosed
US-6503608-B2 Loading printer with ink-receptive elements comprising a support having thereon an image-receiving layer comprising a support having an image-receiving layer comprising a cationic, water-dispersible, quaternized imidazole-containing polymer EASTMAN KODAK COMPANY 2003-01-07 US disclosed
US-20020145635-A1 Ink jet printing method EASTMAN KODAK COMPANY 2002-10-10 US disclosed
EP-1226964-A2 Ink jet printing method EASTMAN KODAK COMPANY (US) 2002-07-31 EP disclosed
US-4430445-A POLYAMIDINE HOHO- AND COPOLYMERS; OXIDATION RESISTANCE; METAL EXTRACTION; POLYEPOXIDE CURING AGENTS ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1984-02-07 US disclosed