SCHEMBL69538

SCHEMBL69538

Cc1cc(C)c(C(=O)P(C)(=O)C(=O)c2c(C)cc(C)cc2C)c(C)c1

nearest known ligand 0.42

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TAS1R3 Q7RTX0 4/20 0.42
TAS1R1 Q7RTX1 4/20 0.42
TAS1R2 Q8TE23 4/20 0.42
KMT2A Q03164 3/20 0.41
HPGD P15428 2/20 0.41
LMNA P02545 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
MEN1 O00255 1/20 0.41
KDM4E B2RXH2 2/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
MCOLN3 Q8TDD5 1/20 0.37
ALDH1A1 P00352 2/20 0.36
MAPT P10636 1/20 0.35
MAPK1 P28482 1/20 0.35
TPMT P51580 1/20 0.34
PGK1 P00558 1/20 0.34
PGK2 P07205 1/20 0.34
HTT P42858 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8398622 0.86 TAS1R3 (0.42) TAS1R3TAS1R1TAS1R2KMT2AHPGD
SCHEMBL1036121 0.86 KDM4E (0.39) TAS1R3TAS1R1TAS1R2KMT2AHPGD
SCHEMBL11123471 0.84 TAS1R3 (0.41) TAS1R3TAS1R1TAS1R2KMT2AHPGD
SCHEMBL28830229 0.84 HPGD (0.42) TAS1R3TAS1R1TAS1R2KMT2AHPGD
SCHEMBL3195966 0.84 TAS1R3 (0.43) TAS1R3TAS1R1TAS1R2KMT2AHPGD
SCHEMBL15822585 0.82 TAS1R3 (0.42) TAS1R3TAS1R1TAS1R2KMT2AHPGD
SCHEMBL28106244 0.82 TAS1R3 (0.42) TAS1R3TAS1R1TAS1R2KMT2AHPGD
SCHEMBL15823830 0.80 TAS1R3 (0.41) TAS1R3TAS1R1TAS1R2KMT2AHPGD
SCHEMBL15823143 0.80 TAS1R3 (0.42) TAS1R3TAS1R1TAS1R2KMT2AHPGD
SCHEMBL15823753 0.80 TAS1R3 (0.41) TAS1R3TAS1R1TAS1R2KMT2AHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 91 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-11322818-A None JP disclosed
EP-4273200-A1 PHOTOINITIATOR PACKAGE COMPRISING SPECIALISED BISACYLPHOSPHINE OXIDE PHOTOINITIATORS AND OPTICAL BRIGHTENER SENSITIZERS IGM Group B.V. (NL) 2023-11-08 EP disclosed
US-20230340285-A1 PHOTOINITIATOR EMULSIONS ARKEMA UK LIMITED C/O BOSTIK LTD. (GB) 2023-10-26 US disclosed
EP-2451847-B1 POLYMER-BOUND BISACYLPHOSPHINE OXIDES IGM GROUP B V (NL) 2021-11-24 EP disclosed
EP-2451847-B1 POLYMER-BOUND BISACYLPHOSPHINE OXIDES IGM GROUP B V (NL) 2021-11-24 EP disclosed
US-20170292075-A1 POLYMERIZABLE COMPOSITION AND FILM USING SAME DIC CORPORATION (JP) 2017-10-12 US disclosed
US-20170292075-A1 POLYMERIZABLE COMPOSITION AND FILM USING SAME DIC CORPORATION (JP) 2017-10-12 US disclosed
EP-3196215-A1 POLYMERIZABLE COMPOSITION AND FILM USING SAME DIC Corporation (JP) 2017-07-26 EP disclosed
US-20160137756-A1 Water Based Concentrated Product Forms of Photoinitiators Made by a Heterophase Polymerization Technique BASF SE (DE) 2016-05-19 US disclosed
US-20160137756-A1 Water Based Concentrated Product Forms of Photoinitiators Made by a Heterophase Polymerization Technique BASF SE (DE) 2016-05-19 US disclosed
US-20030099828-A1 Curable molding material layer; flexibility before curing; workability; adhesion; for reinforcing NIPPON SHOKUBAI CO., LTD. (JP) 2003-05-29 US disclosed
EP-1270200-A1 MULTILAYER MATERIAL Nippon Shokubai Co., Ltd. (JP) 2003-01-02 EP disclosed
US-6316089-B1 UNSATURATED POLYESTER RESIN OR VINYL ESTER RESIN (E.G., ACRYLATED EPOXY RESIN); AT LEAST TWO PHOTOPOLYMERIZATION INITIATORS HAVING PHOTOSENSITIVITY IN DIFFERENT WAVELENGTH RANGES FROM ULTRAVIOLET RANGE TO NEAR INFRARED RANGE SHOWA DENKO K.K. (JP) 2001-11-13 US disclosed
US-6075065-A COMPRISES A POLYURETHANE (METH)ACRYLATE OLIGOMER, AN ETHYLENICALLY UNSATURATED COMPOUND, A BISACYLPHOSPHINE OXIDE-SERIES PHOTOPOLYMERIZATION INITIATOR, AND A TERTIARY AMINE AND NO TIN COMPONENT TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 2000-06-13 US disclosed
US-6057034-A COMPRISING A POLYURETHANE (METH)ACRYLATE OLIGOMER MADE FORM A POLYISOCYANATE, POLYOL, AND HYDROXY-CONTAINING ACRYLATE; AN ETHYLENICALLY UNSATURATED MONOMER, AND PHOTOPOLYMERIZATION INITIATOR; LOW VISCOSITY FOR RAPID FIBER-DRAWING TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 2000-05-02 US disclosed
JP-H11322818-A PHOTO-SETTING COMPOSITION TAIYO INK MFG LTD 1999-11-26 JP disclosed
EP-0922727-A1 Photocurable prepreg sheet for waterproofing Showa Denko Kabushiki Kaisha (JP) 1999-06-16 EP disclosed
EP-0874012-A1 Coating composition for optical fiber TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1998-10-28 EP disclosed
EP-0849296-A2 A photocurable resin composition and a method for producing the same TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1998-06-24 EP disclosed
US-5534559-A UNSATURATED POLYESTERS CIBA-GEIGY CORPORATION (US) 1996-07-09 US disclosed