SCHEMBL6955419

SCHEMBL6955419

N#Cc1cc(=O)c2cccc(NC(=O)CCCCCCCCCCCCCCCc3ccccc3)c2o1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR35 Q9HC97 5/20 0.53
FAAH O00519 1/20 0.46
CES1 P23141 1/20 0.46
CYSLTR2 Q9NS75 4/20 0.44
CYSLTR1 Q9Y271 4/20 0.44
ALOX5 P09917 1/20 0.43
HDAC1 Q13547 1/20 0.43
HDAC2 Q92769 1/20 0.43
F13A1 P00488 1/20 0.42
ABCC4 O15439 1/20 0.42
ABCB11 O95342 1/20 0.42
PGR P06401 1/20 0.42
HTR1A P08908 1/20 0.42
AR P10275 1/20 0.42
CHRM1 P11229 1/20 0.42
DRD1 P21728 1/20 0.42
PTGS1 P23219 1/20 0.42
SLC6A2 P23975 1/20 0.42
PDE4A P27815 1/20 0.42
ADORA1 P30542 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7889278 1.00 GPR35 (0.53) GPR35FAAHCES1CYSLTR2CYSLTR1
SCHEMBL6953595 0.93 GPR35 (0.56) GPR35NPC1RAB9AMEN1KMT2A
SCHEMBL6957556 0.86 GPR35 (0.52) GPR35CYSLTR2CYSLTR1
SCHEMBL6955833 0.86 GPR35 (0.52) GPR35CYSLTR2CYSLTR1
SCHEMBL8106090 0.82 GPR35 (0.62) GPR35CYSLTR2CYSLTR1ABCC4ABCB11
SCHEMBL7896347 0.82 GPR35 (0.59) GPR35CYSLTR2CYSLTR1ALOX5HDAC1
SCHEMBL7897848 0.82 GPR35 (0.59) GPR35CYSLTR2CYSLTR1ALOX5HDAC1
SCHEMBL6962442 0.81 CYSLTR2 (0.67) GPR35CYSLTR2CYSLTR1ABCC4ABCB11
SCHEMBL7079913 0.81 FAAH (0.46) GPR35FAAHCES1CYSLTR2CYSLTR1
SCHEMBL6961653 0.81 MAOB (0.46) FAAHCES1ALOX5HDAC1HDAC2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0711762-B1 PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS SUMITOMO CHEMICAL CO (JP) 2003-08-06 EP disclosed
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 EP disclosed