SCHEMBL6957833

SCHEMBL6957833

CCCCCCCCCC([O])O

nearest known ligand 0.56

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 8/20 0.56
FFAR1 O14842 2/20 0.56
LCK P06239 1/20 0.54
PPARD Q03181 1/20 0.54
ZDHHC20 Q5W0Z9 1/20 0.54
ZDHHC2 Q9UIJ5 1/20 0.54
FDPS P14324 3/20 0.50
FFAR4 Q5NUL3 1/20 0.50
LMNA P02545 1/20 0.50
SPHK1 Q9NYA1 1/20 0.50
ZDHHC7 Q9NXF8 1/20 0.48
MAPT P10636 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3186368 1.00 GPR84 (0.56) GPR84FFAR1LCKPPARDZDHHC20
SCHEMBL8363305 1.00 GPR84 (0.56) GPR84FFAR1LCKPPARDZDHHC20
SCHEMBL27748657 1.00 GPR84 (0.56) GPR84FFAR1LCKPPARDZDHHC20
SCHEMBL6949281 1.00 GPR84 (0.56) GPR84FFAR1LCKPPARDZDHHC20
SCHEMBL3175045 1.00
SCHEMBL28631358 1.00 GPR84 (0.56) GPR84FFAR1LCKPPARDZDHHC20
SCHEMBL7290380 1.00 GPR84 (0.56) GPR84FFAR1LCKPPARDZDHHC20
SCHEMBL6434519 1.00 GPR84 (0.56) GPR84FFAR1LCKPPARDZDHHC20
SCHEMBL6651887 1.00 GPR84 (0.56) GPR84FFAR1LCKPPARDZDHHC20
SCHEMBL3185170 0.97

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0711762-B1 PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS SUMITOMO CHEMICAL CO (JP) 2003-08-06 EP disclosed
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 EP disclosed
US-4362666-A ANTIDEPRESSANTS CIBA-GEIGY CORPORATION (US) 1982-12-07 US disclosed
US-4316900-A Piperazinopyrrolobenzodiazepines CIBA-GEIGY CORPORATION (US) 1982-02-23 US disclosed