SCHEMBL6958012

SCHEMBL6958012

ClC(Cl)(Cl)c1ccc(-c2ccccc2-c2nnn[nH]2)cc1

nearest known ligand 0.35

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.35
DCUN1D1 Q96GG9 2/20 0.33
DCUN1D2 Q6PH85 1/20 0.33
PDE7A Q13946 1/20 0.30
PDE7B Q9NP56 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6957790 0.86 DCUN1D1 (0.34) DCUN1D1DCUN1D2
SCHEMBL29034386 0.82 DCUN1D1 (0.45) DCUN1D1DCUN1D2
SCHEMBL3397570 0.81 DCUN1D1 (0.47) DCUN1D1DCUN1D2
SCHEMBL29499607 0.81 DCUN1D1 (0.47) DCUN1D1DCUN1D2
SCHEMBL12615990 0.79 ALDH1A1 (0.38) DCUN1D1DCUN1D2
SCHEMBL4794234 0.79 DCUN1D1 (0.36) DCUN1D1DCUN1D2
Methylbiphenyl Tetrazole SCHEMBL1774035 0.79 NR1H2 (0.39) TSHRDCUN1D1DCUN1D2
SCHEMBL8035241 0.79 KDR (0.41) DCUN1D1DCUN1D2
Methylbiphenyl Tetrazole SCHEMBL29457258 0.79 NR1H2 (0.39) TSHRDCUN1D1DCUN1D2
SCHEMBL9155822 0.79 ABL1 (0.47) DCUN1D1DCUN1D2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0711762-B1 PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS SUMITOMO CHEMICAL CO (JP) 2003-08-06 EP disclosed
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 EP disclosed