SCHEMBL6962952

SCHEMBL6962952

N#Cc1cccc(CCCCc2ccccc2)c1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DRD2 P14416 2/20 0.49
DRD3 P35462 2/20 0.49
FFAR1 O14842 2/20 0.49
FFAR4 Q5NUL3 1/20 0.49
TSHR P16473 1/20 0.48
FAAH O00519 1/20 0.48
MAOA P21397 3/20 0.47
MAOB P27338 2/20 0.47
IGF1R P08069 1/20 0.47
ALOX15 P16050 1/20 0.47
HTR2B P41595 1/20 0.47
ALDH1A1 P00352 1/20 0.47
KDM1A O60341 1/20 0.47
LMNA P02545 1/20 0.46
GLA P06280 1/20 0.46
KCNJ1 P48048 1/20 0.46
KCNH2 Q12809 1/20 0.46
FOLH1 Q04609 1/20 0.46
NAMPT P43490 1/20 0.45
SLC6A2 P23975 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6951637 0.98 FAAH (0.50) DRD2DRD3FFAR1FFAR4TSHR
SCHEMBL6960752 0.98 FAAH (0.50) DRD2DRD3FFAR1FFAR4TSHR
SCHEMBL28865565 0.94 HTR2B (0.50) DRD2DRD3FFAR1FFAR4MAOA
SCHEMBL24358855 0.92 HTR2B (0.49) FFAR1FFAR4TSHRFAAHHTR2B
SCHEMBL29732423 0.92 HTR2B (0.49) FFAR1FFAR4TSHRFAAHHTR2B
SCHEMBL6950852 0.92 TSHR (0.52) DRD2DRD3FFAR1FFAR4TSHR
SCHEMBL28248372 0.90 HTR2B (0.54) DRD2DRD3FFAR1FFAR4MAOA
SCHEMBL2154019 0.86 GLA (0.53) FFAR1FFAR4TSHRMAOAMAOB
SCHEMBL921919 0.85 TSHR (0.56) DRD2DRD3TSHRHTR2BGLA
SCHEMBL3022843 0.85 HTR2B (0.45) DRD2DRD3FFAR1FFAR4HTR2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0711762-B1 PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS SUMITOMO CHEMICAL CO (JP) 2003-08-06 EP disclosed
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 EP disclosed