SCHEMBL6963067

SCHEMBL6963067

CC(=O)Nc1ccc2oc(-c3nnn[nH]3)cc(=O)c2c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CSNK2A2 P19784 2/20 0.53
CSNK2B P67870 2/20 0.53
CSNK2A1 P68400 1/20 0.53
KDM4E B2RXH2 3/20 0.43
ALDH1A1 P00352 3/20 0.43
HPGD P15428 2/20 0.43
ESR1 P03372 1/20 0.43
POLB P06746 3/20 0.42
KMT2A Q03164 2/20 0.42
MAPT P10636 2/20 0.42
MEN1 O00255 1/20 0.42
PIM1 P11309 1/20 0.42
PIM3 Q86V86 1/20 0.42
PIM2 Q9P1W9 1/20 0.42
CA12 O43570 2/20 0.40
CA9 Q16790 2/20 0.40
CA1 P00915 1/20 0.40
PKM P14618 1/20 0.39
ALOX15 P16050 1/20 0.39
TSHR P16473 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6954703 0.88 PDE10A (0.42) CSNK2A2CSNK2BCSNK2A1KDM4EALDH1A1
SCHEMBL6959658 0.85 JAK2 (0.45) KDM4EALDH1A1HPGDPOLBKMT2A
SCHEMBL6953210 0.83 SMN1; SMN2 (0.44) KDM4EALDH1A1HPGDHSD17B10NPC1
SCHEMBL6953660 0.83 MAPT (0.48) CSNK2A2CSNK2BCSNK2A1KDM4EALDH1A1
SCHEMBL6960926 0.83 SMN1; SMN2 (0.44) KDM4EALDH1A1HPGDHSD17B10NPC1
SCHEMBL6961802 0.81 THRB (0.47) KDM4EALDH1A1POLBKMT2AMAPT
SCHEMBL6962430 0.81 RUVBL1 (0.42) CSNK2A2CSNK2BCSNK2A1KDM4EALDH1A1
SCHEMBL6950746 0.81 POLB (0.51) KDM4EALDH1A1POLBKMT2AMAPT
SCHEMBL6957932 0.79 CYSLTR2 (0.51) KDM4EPOLBKMT2AMAPTMEN1
SCHEMBL6961859 0.79 RUVBL1 (0.49) KDM4EALDH1A1KMT2AMAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0711762-B1 PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS SUMITOMO CHEMICAL CO (JP) 2003-08-06 EP disclosed
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 EP disclosed