SCHEMBL6985219

SCHEMBL6985219

CCCCC(S)C(O)CS

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 2/20 0.39
SPHK1 Q9NYA1 2/20 0.39
GMNN O75496 1/20 0.39
LMNA P02545 1/20 0.39
POLB P06746 1/20 0.39
THPO P40225 1/20 0.39
MTOR P42345 1/20 0.39
BLM P54132 1/20 0.39
KDM4E B2RXH2 1/20 0.39
TP53 P04637 1/20 0.39
CYP1A2 P05177 1/20 0.39
CYP3A4 P08684 1/20 0.39
MAPT P10636 1/20 0.39
CETP P11597 1/20 0.39
HTT P42858 1/20 0.39
UBE2N P61088 1/20 0.39
ALDH1A1 P00352 1/20 0.36
DNM1 Q05193 2/20 0.35
FDPS P14324 1/20 0.34
MMP3 P08254 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6670643 0.87
SCHEMBL11653789 0.80 SPHK1 (0.52) CYP2D6SPHK1GMNNLMNAPOLB
SCHEMBL11282165 0.80 SPHK1 (0.41) CYP2D6SPHK1GMNNLMNAPOLB
SCHEMBL28497518 0.79 DNM1 (0.38) LMNACYP3A4ALDH1A1DNM1FDPS
SCHEMBL11252734 0.77 SPHK1 (0.43) CYP2D6SPHK1GMNNLMNAPOLB
SCHEMBL6666960 0.76
SCHEMBL10975823 0.75
SCHEMBL7893128 0.75 SPHK1 (0.47) CYP2D6SPHK1GMNNLMNAPOLB
SCHEMBL16062057 0.74
SCHEMBL2047302 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0751161-B1 Sulfur-containing urethane-based resin composition, optical element and lens comprising this resin MITSUI CHEMICALS INC (JP) 2003-01-02 EP disclosed
CN-1082968-C Sulfur-containing urethane-based resin composition, its resin, and optical element and lens comprising resin thereof MITSUI CHEMICALS INC (JP) 2002-04-17 CN disclosed
US-5736609-A A POLYTHIO COMPOUND CONTAINING AT LEAST TWO MERCAPTO GROUPS, A POLYISO(THIO)CYANATE COMPOUND, AND A COMPOUND HAVING TWO OR MORE UNSATURATED REACTIVE GROUPS MITSUI TOATSU CHEMICALS, INC. (JP) 1998-04-07 US disclosed
CN-1148055-A Sulfur-containing urethane-based resin composition, its resin, and optical element and lens comprising resin thereof MITSUI TOATSU CHEMICALS (JP) 1997-04-23 CN disclosed
EP-0751161-A2 Sulfur-containing urethane-based resin composition, optical element and lens comprising this resin MITSUI TOATSU CHEMICALS, Inc. (JP) 1997-01-02 EP disclosed