SCHEMBL6986550

SCHEMBL6986550

C=CC(=O)OC(C)COc1ccc(S)cc1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
THRB P10828 3/20 0.38
ACACB O00763 3/20 0.38
TSHR P16473 1/20 0.38
LMNA P02545 2/20 0.36
POLB P06746 1/20 0.36
MAPT P10636 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
CYP2D6 P10635 1/20 0.36
GAA P10253 1/20 0.36
HTT P42858 1/20 0.36
TAS1R3 Q7RTX0 1/20 0.35
TAS1R1 Q7RTX1 1/20 0.35
MTNR1A P48039 3/20 0.34
MTNR1B P49286 3/20 0.34
KMT2A Q03164 2/20 0.33
MEN1 O00255 1/20 0.33
KDM4E B2RXH2 1/20 0.33
ALDH1A1 P00352 1/20 0.33
ACACA Q13085 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9854345 0.92 TSHR (0.43) THRBACACBTSHRLMNAPOLB
SCHEMBL14173246 0.88 ACACB (0.43) THRBACACBTSHRLMNAPOLB
SCHEMBL14173248 0.88 ACACB (0.43) THRBACACBTSHRLMNAPOLB
SCHEMBL13554408 0.88 MAPT (0.43) THRBACACBTSHRLMNAPOLB
SCHEMBL22588946 0.87 HPGD (0.42) THRBACACBTSHRMAPTHTT
SCHEMBL28432324 0.87 PTGS1 (0.43) THRBACACBTSHRLMNAGAA
SCHEMBL28574458 0.85 TDP1 (0.43) THRBACACBTSHRLMNAPOLB
SCHEMBL4200257 0.85 THRB (0.44) THRBACACBTSHRLMNAPOLB
SCHEMBL181492 0.85 THRB (0.54) THRBTSHRLMNAMAPTCYP2D6
SCHEMBL28440337 0.84 THRB (0.37) THRBACACBTSHRLMNAPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111491963-B Method for producing (meth) acrylic composition, coating material containing (meth) acrylic composition, and cured body 三菱瓦斯化学株式会社 2023-04-28 CN disclosed
CN-113710750-B (meth) acrylic composition, coating material containing same, and cured product 三菱瓦斯化学株式会社 2022-07-12 CN disclosed
CN-113710750-A (meth) acrylic composition, coating material containing same, and cured product 三菱瓦斯化学株式会社 2021-11-26 CN disclosed
CN-108603953-B Light diffusing agent, light diffusing resin composition, and molded article 三菱瓦斯化学株式会社 2021-08-24 CN disclosed
CN-111491963-A Method for producing (meth) acrylic composition, and coating material and cured body containing (meth) acrylic composition 三菱瓦斯化学株式会社 2020-08-04 CN disclosed
CN-102718932-B Photosensitive copolymer and photoresist composition ROHM & HAAS ELECT MAT 2015-03-11 CN disclosed
EP-1361392-A1 SURFACE LIGHT SOURCE SYSTEM AND OPTICAL DEFLECTION ELEMENT Mitsubishi Rayon Co., Ltd. (JP) 2003-11-12 EP disclosed