SCHEMBL6987108

SCHEMBL6987108

C=CC(=O)OC1CCC(CC(O)(C(F)(F)F)C(F)(F)F)CC1

nearest known ligand 0.37

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
THRA P10827 1/20 0.37
THRB P10828 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13906723 0.85 ALDH1A1 (0.31)
SCHEMBL13012089 0.83
SCHEMBL23963203 0.82 THRA (0.37) THRATHRB
SCHEMBL19148121 0.81 THRA (0.57) THRATHRB
SCHEMBL13906726 0.78 ALDH1A1 (0.31) THRATHRB
SCHEMBL13515119 0.77
SCHEMBL14907534 0.77 THRA (0.34) THRATHRB
SCHEMBL31132064 0.77 THRA (0.34) THRATHRB
SCHEMBL10070094 0.76 TEAD1 (0.30)
SCHEMBL321481 0.76 TSHR (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8182977-B2 Polymer and positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2012-05-22 US disclosed
US-20100323296-A1 RESIN AND RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-12-23 US disclosed
US-20100239981-A1 POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-09-23 US disclosed
US-20090061360-A1 MATERIAL FOR RESIST PROTECTIVE FILM FOR IMMERSION LITHOGRAPHY ASAHI GLASS COMPANY, LIMITED (JP) 2009-03-05 US disclosed