Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | SHBG | P04278 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13098500 | 0.92 | TSHR (0.32) | TSHRSHBG | |
| SCHEMBL15151206 | 0.82 | TSHR (0.36) | TSHR | |
| SCHEMBL30928250 | 0.81 | TSHR (0.37) | TSHRSHBGEPHX2 | |
| SCHEMBL18498 | 0.81 | TSHR (0.37) | TSHRSHBGEPHX2 | |
| SCHEMBL579272 | 0.81 | EPHX1 (0.40) | TSHRSHBGEPHX2 | |
| SCHEMBL579573 | 0.81 | EPHX1 (0.40) | TSHRSHBGEPHX2 | |
| SCHEMBL9815710 | 0.81 | TSHR (0.37) | TSHRSHBGEPHX2 | |
| SCHEMBL114150 | 0.81 | EPHX1 (0.40) | TSHRSHBGEPHX2 | |
| SCHEMBL12303578 | 0.79 | LMNA (0.37) | TSHRSHBG | |
| SCHEMBL13360079 | 0.79 | LMNA (0.37) | TSHRSHBG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230314943-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2023-10-05 | — | — | US | disclosed |
| US-20220187706-A1 | THIN FILM RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2022-06-16 | — | — | US | disclosed |
| US-11163233-B2 | Chemically amplified positive type photoresist composition and pattern forming method using the same | MERCK PATENT GMBH (DE) | 2021-11-02 | — | — | US | disclosed |
| EP-1199603-B1 | Positive photosensitive composition | FUJIFILM CORP (JP) | 2016-11-30 | — | — | EP | disclosed |
| EP-1158363-B1 | Positive resist composition and onium salts of saccharin derivatives | FUJIFILM CORP (JP) | 2014-01-22 | — | — | EP | disclosed |
| US-8580455-B2 | Crosslinked polybenzoxazines, electrolyte membrane including the same, and fuel cell employing the electrolyte membrane | SAMSUNG SDI CO., LTD. (KR) | 2013-11-12 | — | — | US | disclosed |
| US-7812194-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-7812194-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-20100255419-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-20100255419-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-7776512-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-08-17 | — | — | US | disclosed |
| US-20090148791-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-20090148791-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2009-06-11 | — | — | US | disclosed |
| US-7435526-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-10-14 | — | — | US | disclosed |
| US-7435526-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-10-14 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |
| US-20070003871-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-04 | — | — | US | disclosed |
| EP-0831369-B1 | Positive photosensitive composition | FUJI PHOTO FILM CO LTD (JP) | 2003-01-02 | — | — | EP | disclosed |
| US-5981140-A | COMPRISES A RESIN GROUP CAPABLE OF DECOMPOSING BY THE ACTION OF AN ACID TO ENHANCE SOLUBILITY OF THE RESIN IN AN ALKALINE DEVELOPING SOLUTION AND A SULFONIUM OR IODINIUM ARYLATE CONTAINING AROMATIC SULFONIC ACID COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1999-11-09 | — | — | US | disclosed |
| EP-0831369-A2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-03-25 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100255419-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | RARA, SUN2, RARG | TSHR 4674/4885SHBG 4486/4885EPHX2 1816/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.