Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL1321891 | 1.00 | ALDH1A1 (0.53) | — | |
| Acetic Acid SCHEMBL6838880 | 1.00 | ALDH1A1 (0.53) | — | |
| Acetic Acid SCHEMBL5819601 | 0.97 | ALDH1A1 (0.57) | — | |
| Acetic Acid SCHEMBL2140076 | 0.97 | ALDH1A1 (0.57) | — | |
| Acetic Acid SCHEMBL28674854 | 0.97 | ALDH1A1 (0.57) | — | |
| Acetic Acid SCHEMBL503041 | 0.97 | — | — | |
| Acetic Acid SCHEMBL11054868 | 0.97 | ALDH1A1 (0.57) | — | |
| Acetic Acid SCHEMBL4530471 | 0.93 | ALDH1A1 (0.53) | — | |
| Acetic Acid SCHEMBL3650850 | 0.93 | ALDH1A1 (0.53) | — | |
| Acetic Acid SCHEMBL10983317 | 0.93 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8125134-B2 | Electron-emitting device, method of manufacturing the same, electron source, and image display apparatus | CANON KABUSHIKI KAISHA (JP) | 2012-02-28 | — | — | US | disclosed |
| US-7964336-B2 | Metal or metal compound pattern and forming method of pattern, and electron emitting device, electron source, and image-forming apparatus using the pattern | CANON KABUSHIKI KAISHA (JP) | 2011-06-21 | — | — | US | disclosed |
| EP-1119014-B1 | Glass substrate processing method and glass substrate recycling processing method for a flat display | CANON KK (JP) | 2011-04-06 | — | — | EP | disclosed |
| US-20090322206-A1 | ELECTRON-EMITTING DEVICE, METHOD OF MANUFACTURING THE SAME, ELECTRON SOURCE, AND IMAGE DISPLAY APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2009-12-31 | — | — | US | disclosed |
| CN-100530494-C | Metal or metal compound pattern and forming method of pattern | CANON KK (JP) | 2009-08-19 | — | — | CN | disclosed |
| US-20090186302-A1 | METAL OR METAL COMPOUND PATTERN AND FORMING METHOD OF PATTERN, AND ELECTRON EMITTING DEVICE, ELECTRON SOURCE, AND IMAGE-FORMING APPARATUS USING THE PATTERN | CANON KABUSHIKI KAISHA (JP) | 2009-07-23 | — | — | US | disclosed |
| US-7556913-B2 | Metal or metal compound pattern and forming method of pattern, and electron emitting device, electron source, and image-forming apparatus using the pattern | CANON KABUSHIKI KAISHA (JP) | 2009-07-07 | — | — | US | disclosed |
| CN-100452274-C | Electron-emitting device, electron source, image display apparatus, and television apparatus | CANON KK (JP) | 2009-01-14 | — | — | CN | disclosed |
| US-7416462-B2 | Glass substrate processing method and material removal process using x-ray fluorescence | CANON KABUSHIKI KAISHA (JP) | 2008-08-26 | — | — | US | disclosed |
| EP-1335399-B1 | Methods for producing electron-emitting device, electron source, and image-forming apparatus | CANON KK (JP) | 2007-09-05 | — | — | EP | disclosed |
| US-6005334-A | Electron-emitting apparatus having a periodical electron-emitting region | CANON KABUSHIKI KAISHA (JP) | 1999-12-21 | — | — | US | disclosed |
| EP-0936653-A1 | Methods for producing electron-emitting device, electron source, and image-forming apparatus | CANON KABUSHIKI KAISHA (JP) | 1999-08-18 | — | — | EP | disclosed |
| CN-1208945-A | Method for prodn. of electron source substrate provided with electron emitting element and method for prodn. of electronic device using the substrate | CANON KK (JP) | 1999-02-24 | — | — | CN | disclosed |
| CN-1174400-A | Method of manufacturing electron-emitting device, electron source and image-forming apparatus using the same | CANON KK (JP) | 1998-02-25 | — | — | CN | disclosed |
| EP-0805472-A1 | Electron-emitting apparatus, image-forming apparatus using the same, and manufacturing method therefor | CANON KABUSHIKI KAISHA (JP) | 1997-11-05 | — | — | EP | disclosed |
| EP-0803890-A1 | Method of manifacturing electron emitting device, electron source and image-forming apparatus using the same | CANON KABUSHIKI KAISHA (JP) | 1997-10-29 | — | — | EP | disclosed |
| EP-0769796-A1 | Method of manufacturing electron-emitting device, electron source and image-forming apparatus | CANON KABUSHIKI KAISHA (JP) | 1997-04-23 | — | — | EP | disclosed |
| EP-0393612-B1 | Rhodium-free, palladium and platinum containing catalyst supported on zirconia and/or lanthana stabilized ceria | ENGELHARD CORP (US) | 1996-05-29 | — | — | EP | disclosed |
| US-5128306-A | Catalytic exhaust system | ENGELHARD CORPORATION (US) | 1992-07-07 | — | — | US | disclosed |
| EP-0393612-A2 | Rhodium-free, palladium and platinum containing catalyst supported on zirconia and/or lanthana stabilized ceria | ENGELHARD CORPORATION (US) | 1990-10-24 | — | — | EP | disclosed |