Known targets — ChEMBL curated mechanism
CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.59 |
| ▸ | CYP2C9 | P11712 | 3/20 | 0.59 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.59 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.59 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.59 |
| ▸ | TSHR | P16473 | 2/20 | 0.59 |
| ▸ | HTT | P42858 | 1/20 | 0.59 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.59 |
| ▸ | DNM1 | Q05193 | 6/20 | 0.50 |
| ▸ | MCHR1 | Q99705 | 1/20 | 0.49 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.48 |
| ▸ | APAF1 | O14727 | 1/20 | 0.47 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.47 |
| ▸ | RAD52 | P43351 | 1/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | THPO | P40225 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | BBOX1 | O75936 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL330681 | 1.00 | LMNA (0.59) | LMNACYP2C9KCNH2CYP2D6CYP2C19 | |
| SCHEMBL2181552 | 1.00 | LMNA (0.59) | LMNACYP2C9KCNH2CYP2D6CYP2C19 | |
| SCHEMBL2181688 | 1.00 | LMNA (0.59) | LMNACYP2C9KCNH2CYP2D6CYP2C19 | |
| SCHEMBL31327346 | 1.00 | LMNA (0.59) | LMNACYP2C9KCNH2CYP2D6CYP2C19 | |
| SCHEMBL8723514 | 1.00 | LMNA (0.59) | LMNACYP2C9KCNH2CYP2D6CYP2C19 | |
| SCHEMBL31327347 | 1.00 | LMNA (0.59) | LMNACYP2C9KCNH2CYP2D6CYP2C19 | |
| SCHEMBL331065 | 1.00 | LMNA (0.59) | LMNACYP2C9KCNH2CYP2D6CYP2C19 | |
| Cetrimonium SCHEMBL121980 | 1.00 | LMNA (0.59) | LMNACYP2C9KCNH2CYP2D6CYP2C19 | |
| Cetrimonium SCHEMBL5678134 | 0.98 | KCNH2 (0.57) | LMNACYP2C9KCNH2CYP2D6CYP2C19 | |
| Cetrimonium SCHEMBL28609304 | 0.98 | KCNH2 (0.57) | LMNACYP2C9KCNH2CYP2D6CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 372 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11929257-B2 | Etching solution and method for aluminum nitride | VERSUM MATERIALS US, LLC (US) | 2024-03-12 | — | — | US | claimed |
| US-20220367199-A1 | ETCHING SOLUTION AND METHOD FOR ALUMINUM NITRIDE | VERSUM MATERIALS US, LLC (US) | 2022-11-17 | — | — | US | claimed |
| EP-3959291-A1 | ETCHING SOLUTION AND METHOD FOR ALUMINUM NITRIDE | Versum Materials US, LLC (US) | 2022-03-02 | — | — | EP | claimed |
| WO-2020185745-A1 | ETCHING SOLUTION AND METHOD FOR ALUMINUM NITRIDE | VERSUM MATERIALS US, LLC (US) | 2020-09-17 | — | — | WO | claimed |
| US-20160185595-A1 | AQUEOUS FORMULATIONS FOR REMOVING METAL HARD MASK AND POST-ETCH RESIDUE WITH Cu/W COMPATIBILITY | TRUIST BANK, AS NOTES COLLATERAL AGENT | 2016-06-30 | — | — | US | claimed |
| EP-3027709-A1 | AQUEOUS FORMULATIONS FOR REMOVING METAL HARD MASK AND POST-ETCH RESIDUE WITH Cu/W COMPATIBILITY | Advanced Technology Materials, Inc. (US) | 2016-06-08 | — | — | EP | claimed |
| WO-2015017659-A1 | AQUEOUS FORMULATIONS FOR REMOVING METAL HARD MASK AND POST-ETCH RESIDUE WITH Cu/W COMPATIBILITY | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2015-02-05 | — | — | WO | claimed |
| US-20080305157-A1 | Encapsulation and separation of charged organic solutes inside catanionic vesicles | UNIVERSITY OF MARYLAND OFFICE OF TECHNOLOGY COMMERCIALIZATION (US) | 2008-12-11 | — | — | US | claimed |
| EP-4159460-B1 | LAYERED BODY | FUJIFILM CORP (JP) | 2026-04-22 | — | — | EP | disclosed |
| EP-4186708-B1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING A LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORP (JP) | 2026-03-04 | — | — | EP | disclosed |
| EP-4269122-B1 | LAMINATE OF NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE PRECURSORS AND METHOD OF PREPARING NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORP (JP) | 2026-03-04 | — | — | EP | disclosed |
| EP-4349602-B1 | ON-MACHINE DEVELOPMENT TYPE NEGATIVE PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PREPARING A PLANOGRAPHIC PRINTING PLATE, AND PLANOGRAPHIC PRINTING METHOD | FUJIFILM CORP (JP) | 2025-11-12 | — | — | EP | disclosed |
| EP-3991988-B1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PREPARING A LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORP (JP) | 2025-11-05 | — | — | EP | disclosed |
| EP-3991989-B1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORP (JP) | 2025-11-05 | — | — | EP | disclosed |
| US-20010034390-A1 | Antistatic composition | KAO CORPORATION (JP) | 2001-10-25 | — | — | US | disclosed |
| EP-1134268-A1 | Antistatic composition | KAO CORPORATION (JP) | 2001-09-19 | — | — | EP | disclosed |
| EP-0309622-B1 | Method for reducing build up of electrostatic charges on transparent synthetic macromolecular materials selected from polymethyl methycrylate or polycarbonate | TAKEMOTO OIL & FAT CO LTD (JP) | 1997-03-05 | — | — | EP | disclosed |
| US-5165994-A | Spontaneous equilbrium surfactant vesicles | UNIVERSITY OF DELAWARE (US) | 1992-11-24 | — | — | US | disclosed |
| EP-0382957-A1 | Antistatic resin composition with transparency | Takemoto Yushi Kabushiki Kaisha (JP) | 1990-08-22 | — | — | EP | disclosed |
| US-4943380-A | HEAT RESISTANCE | TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) | 1990-07-24 | — | — | US | disclosed |