SCHEMBL701472

SCHEMBL701472

C=CC(=O)NC(O)c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TGM2 P21980 2/20 0.50
CYP2C19 P33261 3/20 0.47
LMNA P02545 2/20 0.42
MAPK1 P28482 1/20 0.42
TSHR P16473 1/20 0.42
CES2 O00748 1/20 0.41
CES1 P23141 1/20 0.41
AKT1 P31749 1/20 0.41
TDP1 Q9NUW8 1/20 0.40
ALDH1A1 P00352 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
GSTO1 P78417 2/20 0.40
HPGD P15428 1/20 0.39
CYP2D6 P10635 1/20 0.39
SRC P12931 1/20 0.39
CTRB1 P17538 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17320255 0.82 TGM2 (0.52) TGM2CYP2C19LMNATSHRAKT1
SCHEMBL3903507 0.82 CYP2C19 (0.68) TGM2CYP2C19TSHRAKT1TDP1
SCHEMBL345815 0.82 TGM2 (0.52) TGM2CYP2C19LMNATSHRAKT1
SCHEMBL27701677 0.79 TGM2 (0.48) TGM2CYP2C19LMNATSHRAKT1
SCHEMBL4415392 0.79 TDP1 (0.63) LMNATSHRTDP1ALDH1A1HPGD
SCHEMBL28207649 0.79 TDP1 (0.63) LMNATSHRTDP1ALDH1A1HPGD
SCHEMBL5527681 0.79 TDP1 (0.63) LMNATSHRTDP1ALDH1A1HPGD
SCHEMBL7745702 0.79 CYP2C19 (0.49) TGM2CYP2C19LMNAMAPK1TSHR
SCHEMBL17310391 0.79 CYP2C19 (0.53) TGM2CYP2C19LMNATSHRTDP1
SCHEMBL17310390 0.79 CYP2C19 (0.53) TGM2CYP2C19LMNATSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2020421-B1 Self-crosslinking dispersions utilizing acrylamide/N-alkylolacrylamide crosslinking mixture with C2-C10 alkylol CELANESE INT CORP (US) 2012-01-11 EP claimed
US-20110152451-A1 Self-crosslinking dispersions utilizing Acrylamide/N-Alkylolacrylamide crosslinking mixture with C2-C10 Alkylol GOLDSTEIN JOEL E 2011-06-23 US claimed
US-7897708-B2 e.g. acrylamide-N-ethylolAcrylamide and another monomer such as vinyl versatate, acrylates, olefins, styrene, butadiene, or vinyl acetate; useful as binders for nonwoven fibrous webs; provide formaldehyde-free latex polymers CELANESE INTERNATIONAL CORP. (US) 2011-03-01 US claimed
US-20090036574-A1 Self-crosslinking dispersions utilizing acrylamide/N-alkylolacrylamide crosslinking mixture with C2-C10 alkylol CELANESE INTERNATIONAL CORPORATION 2009-02-05 US claimed
EP-2020421-A1 Self-crosslinking dispersions utilizing acrylamide/N-alkylolacrylamide crosslinking mixture with C2-C10 alkylol Celanese International Corporation (US) 2009-02-04 EP claimed
US-20070099816-A1 Hard Surface Cleaning Composition THE CLOROX COMPANY 2007-05-03 US claimed
US-5021529-A Containing an alkylol amide of an alpha, beta ethylenically un saturated carboxylic acid and itaconic acid THE B. F. GOODRICH COMPANY (US) 1991-06-04 US claimed
CN-106459238-B Lightproof composition 富士胶片株式会社 2018-11-13 CN disclosed
CN-106459238-A Light-blocking composition 富士胶片株式会社 2017-02-22 CN disclosed
CN-104704078-B Adhesive composition 东友精细化工有限公司 2016-08-17 CN disclosed
CN-105829967-A Positive-type photosensitive resin composition 日产化学工业株式会社 2016-08-03 CN disclosed
CN-105143937-A Polarizing plate, method for producing same and liquid crystal display device KONICA MINOLTA INC 2015-12-09 CN disclosed
CN-103328214-A Lithographic printing plate precursor AGFA GRAPHICS NV 2013-09-25 CN disclosed
EP-2020421-A1 Self-crosslinking dispersions utilizing acrylamide/N-alkylolacrylamide crosslinking mixture with C2-C10 alkylol Celanese International Corporation (US) 2009-02-04 EP disclosed
US-20070099816-A1 Hard Surface Cleaning Composition THE CLOROX COMPANY 2007-05-03 US disclosed
CN-1934497-A Negative radiation-sensitive resin composition JSR CORP (JP) 2007-03-21 CN disclosed
CN-1908816-A Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material JSR CORP (JP) 2007-02-07 CN disclosed
US-5858604-A PREPARED FROM DIGITAL IMAGE SIGNALS WITH USE OF PRESENSITIZED LITHOGRAPHIC PLATE KONICA CORPORATION (JP) 1999-01-12 US disclosed
EP-0720057-A1 ORIGINAL FORM FOR LITHOGRAPHIC PLATE AND PROCESS FOR PREPARING LITHOGRAPHIC PLATE KONICA CORPORATION (JP) 1996-07-03 EP disclosed
US-5021529-A Containing an alkylol amide of an alpha, beta ethylenically un saturated carboxylic acid and itaconic acid THE B. F. GOODRICH COMPANY (US) 1991-06-04 US disclosed