SCHEMBL701587

SCHEMBL701587

CC[Al](CC)OC(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11791095 0.75
SCHEMBL28141439 0.75
SCHEMBL6648625 0.73
SCHEMBL11876814 0.71 LMNA (0.31)
SCHEMBL3696116 0.71
SCHEMBL9676693 0.69 LMNA (0.34)
SCHEMBL27638382 0.68 TSHR (0.38)
SCHEMBL31235576 0.67
SCHEMBL2889252 0.64
Hexane SCHEMBL7071302 0.63 TSHR (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12494362-B2 Atomic layer deposition of aluminum oxide films for semiconductor devices using an aluminum alkoxide oxidizer TOKYO ELECTRON LIMITED (JP) 2025-12-09 US claimed
US-20220310385-A1 ATOMIC LAYER DEPOSITION OF ALUMINUM OXIDE FILMS FOR SEMICONDUCTOR DEVICES USING AN ALUMINUM ALKOXIDE OXIDIZER TOKYO ELECTRON LIMITED (JP) 2022-09-29 US claimed
WO-2022203969-A1 ATOMIC LAYER DEPOSITION OF ALUMINUM OXIDE FILMS FOR SEMICONDUCTOR DEVICES USING AN ALUMINUM ALKOXIDE OXIDIZER TOKYO ELECTRON LIMITED (JP) 2022-09-29 WO claimed
US-3954958-A HYDROLYSIS OF ALKYL-ALUMINUM COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JA) 1976-05-04 US claimed
US-12494362-B2 Atomic layer deposition of aluminum oxide films for semiconductor devices using an aluminum alkoxide oxidizer TOKYO ELECTRON LIMITED (JP) 2025-12-09 US disclosed
US-20220310385-A1 ATOMIC LAYER DEPOSITION OF ALUMINUM OXIDE FILMS FOR SEMICONDUCTOR DEVICES USING AN ALUMINUM ALKOXIDE OXIDIZER TOKYO ELECTRON LIMITED (JP) 2022-09-29 US disclosed
WO-2022203969-A1 ATOMIC LAYER DEPOSITION OF ALUMINUM OXIDE FILMS FOR SEMICONDUCTOR DEVICES USING AN ALUMINUM ALKOXIDE OXIDIZER TOKYO ELECTRON LIMITED (JP) 2022-09-29 WO disclosed
CN-105073823-B Cyclopentene ring-opening copolymer, its manufacture method and rubber composition 日本瑞翁株式会社 2017-08-25 CN disclosed
CN-105579436-A Onium salt, and composition containing same ASAHI KASEI E MATERIALS CORP 2016-05-11 CN disclosed
CN-105073823-A Cyclopentene ring-opening copolymer, method for producing same, and rubber composition ZEON CORP 2015-11-18 CN disclosed
US-20120097922-A1 LIGHT EMITTING ELEMENT, METHOD OF PRODUCING SAME, LAMP, ELECTRONIC EQUIPMENT, AND MECHINICAL APPARATUS SHOWA DENKO K.K. (JP) 2012-04-26 US disclosed
US-8124992-B2 Light-emitting device, manufacturing method thereof, and lamp SHOWA DENKO K.K. (JP) 2012-02-28 US disclosed
EP-0083839-B1 PROCESS FOR PRODUCING INORGANIC FIBER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1986-03-05 EP disclosed
US-4495121-A SPINNING A POLYMETALOXANE, CALCINING SUMITOMO CHEMICAL COMPANY, LTD. (JP) 1985-01-22 US disclosed
EP-0083839-A2 Process for producing inorganic fiber SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1983-07-20 EP disclosed
US-4115415-A FROM ALKYLENE OXIDES NISSO PETROCHEMICAL INDUSTRIES CO., LTD. (JP) 1978-09-19 US disclosed
US-4101615-A Process for producing alumina fiber or alumina-silica fiber SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1978-07-18 US disclosed
US-4022808-A ZINC-ALUMINUM-TITANIUM-TIN-IRON OR GROUP 5A AS CATALYSTS NIPPON SODA COMPANY LIMITED (JA) 1977-05-10 US disclosed
US-3988333-A Tri-substituted aluminum salts or di-substituted aluminum salts of carboxyl group-containing, pharmaceutically effective compounds TEIKOKU HORMONE MFG. CO., LTD. (JA) 1976-10-26 US disclosed
US-3954958-A HYDROLYSIS OF ALKYL-ALUMINUM COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JA) 1976-05-04 US disclosed