Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 3/20 | 0.38 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.38 |
| ▸ | TRPM8 | Q7Z2W7 | 6/20 | 0.33 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.33 |
| ▸ | SLC22A1 | O15245 | 2/20 | 0.32 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2192862 | 0.83 | ADRB2 (0.33) | TSHR | |
| SCHEMBL28172544 | 0.83 | DNM1 (0.33) | TSHRTHRBLMNAOPRM1DNM1 | |
| SCHEMBL27512012 | 0.81 | DNM1 (0.36) | TSHRTHRBLMNADNM1 | |
| SCHEMBL1050532 | 0.79 | ADRB2 (0.35) | TSHR | |
| SCHEMBL1051083 | 0.79 | ADRB2 (0.35) | TSHR | |
| SCHEMBL1268918 | 0.77 | — | — | |
| SCHEMBL19713169 | 0.76 | LMNA (0.34) | TSHRTHRBLMNAOPRM1TRPM8 | |
| SCHEMBL9676693 | 0.76 | LMNA (0.34) | TSHRTHRBLMNAOPRM1TRPM8 | |
| SCHEMBL19713153 | 0.74 | TSHR (0.38) | TSHRTHRBLMNAOPRM1TRPM8 | |
| SCHEMBL19713188 | 0.74 | TSHR (0.38) | TSHRTHRBLMNAOPRM1TRPM8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6620670-B2 | Process conditions and precursors for atomic layer deposition (ALD) of AL2O3 | APPLIED MATERIALS, INC. | 2003-09-16 | — | — | US | claimed |
| US-20030139005-A1 | PROCESS CONDITIONS AND PRECURSORS FOR ATOMIC LAYER DEPOSITION (ALD) OF AL2O3 | APPLIED MATERIALS, INC. | 2003-07-24 | — | — | US | claimed |
| US-6620670-B2 | Process conditions and precursors for atomic layer deposition (ALD) of AL2O3 | APPLIED MATERIALS, INC. | 2003-09-16 | — | — | US | disclosed |
| US-20030139005-A1 | PROCESS CONDITIONS AND PRECURSORS FOR ATOMIC LAYER DEPOSITION (ALD) OF AL2O3 | APPLIED MATERIALS, INC. | 2003-07-24 | — | — | US | disclosed |