Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.37 |
| ▸ | TUBB1 | Q9H4B7 | 1/20 | 0.36 |
| ▸ | SSTR4 | P31391 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.30 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3871375 | 0.85 | EPHX1 (0.37) | EPHX1TUBB1SSTR4KEAP1NFE2L2 | |
| SCHEMBL479255 | 0.82 | EPHX1 (0.34) | EPHX1TUBB1SSTR4KEAP1NFE2L2 | |
| SCHEMBL7618007 | 0.82 | EPHX1 (0.34) | EPHX1TUBB1SSTR4KEAP1NFE2L2 | |
| SCHEMBL7618010 | 0.82 | EPHX1 (0.34) | EPHX1TUBB1SSTR4KEAP1NFE2L2 | |
| SCHEMBL10815498 | 0.82 | EPHX1 (0.34) | EPHX1TUBB1SSTR4KEAP1NFE2L2 | |
| SCHEMBL27683450 | 0.77 | TUBB1 (0.32) | EPHX1TUBB1 | |
| SCHEMBL1581230 | 0.75 | GRIK1 (0.33) | EPHX1TUBB1 | |
| SCHEMBL11122467 | 0.73 | GRIK1 (0.37) | EPHX1 | |
| SCHEMBL8753804 | 0.70 | TUBB1 (0.32) | TUBB1 | |
| SCHEMBL8753783 | 0.70 | TUBB1 (0.32) | TUBB1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9594303-B2 | Resist pattern-forming method and photoresist composition | JSR CORPORATION (JP) | 2017-03-14 | — | — | US | disclosed |
| US-9500950-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| US-9348226-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-05-24 | — | — | US | disclosed |
| US-20160062237-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2016-03-03 | — | — | US | disclosed |
| US-9213236-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-12-15 | — | — | US | disclosed |
| US-20150010866-A1 | RESIST PATTERN-FORMING METHOD AND PHOTORESIST COMPOSITION | JSR CORPORATION (JP) | 2015-01-08 | — | — | US | disclosed |
| US-8808974-B2 | Method for forming pattern | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20140162190-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2014-06-12 | — | — | US | disclosed |
| US-8734904-B2 | Methods of forming topographical features using segregating polymer mixtures | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-27 | — | — | US | disclosed |
| US-20120135146-A1 | METHODS OF FORMING TOPOGRAPHICAL FEATURES USING SEGREGATING POLYMER MIXTURES | JSR CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |
| US-8124314-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20110212401-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2011-09-01 | — | — | US | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-7704669-B2 | Acrylic polymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2010-04-27 | — | — | US | disclosed |
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20070269754-A1 | Acrylic Polymer and Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060234154-A1 | Mixture containing acid generator and free radical catalyst; acrylated ester monomer | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |