SCHEMBL3871375

SCHEMBL3871375

CC(=CC(C)(C)C1CCCCC1)C(=O)O

nearest known ligand 0.37

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.37
TUBB1 Q9H4B7 1/20 0.36
SSTR4 P31391 1/20 0.33
KEAP1 Q14145 1/20 0.30
NFE2L2 Q16236 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL701590 0.85 EPHX1 (0.37) EPHX1TUBB1SSTR4KEAP1NFE2L2
SCHEMBL7618010 0.82 EPHX1 (0.34) EPHX1TUBB1SSTR4KEAP1NFE2L2
SCHEMBL10815498 0.82 EPHX1 (0.34) EPHX1TUBB1SSTR4KEAP1NFE2L2
SCHEMBL479255 0.82 EPHX1 (0.34) EPHX1TUBB1SSTR4KEAP1NFE2L2
SCHEMBL7618007 0.82 EPHX1 (0.34) EPHX1TUBB1SSTR4KEAP1NFE2L2
SCHEMBL27683450 0.77 TUBB1 (0.32) EPHX1TUBB1
SCHEMBL1581230 0.75 GRIK1 (0.33) EPHX1TUBB1
SCHEMBL11122467 0.73 GRIK1 (0.37) EPHX1
SCHEMBL2994782 0.72 CES2 (0.31)
SCHEMBL27173977 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4372030-A1 CURABLE RESIN COMPOSITION Namics Corporation (JP) 2024-05-22 EP disclosed
EP-4372021-A1 CURABLE RESIN COMPOSITION Namics Corporation (JP) 2024-05-22 EP disclosed
WO-2024089905-A1 RESIN COMPOSITION, ADHESIVE, SEALANT, CURED PRODUCT, SEMICONDUCTOR DEVICE AND ELECTRONIC COMPONENT NAMICS CORPORATION (JP) 2024-05-02 WO disclosed
WO-2024089906-A1 RESIN COMPOSITION, ADHESIVE, SEALANT, CURED PRODUCT AND SEMICONDUCTOR DEVICE NAMICS CORPORATION (JP) 2024-05-02 WO disclosed
US-20200201176-A1 Resist Composition and Resist Pattern Forming Method TOKYO ELECTRON LIMITED (JP) 2020-06-25 US disclosed
US-20190146340-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2019-05-16 US disclosed
US-9587065-B2 Composition for pattern formation, and pattern-forming method JSR CORPORATION (JP) 2017-03-07 US disclosed
US-20150323870-A1 COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2015-11-12 US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed