SCHEMBL7019338

SCHEMBL7019338

CCN1C(=O)C(=C2Sc3ccccc3N2CC)SC1=S

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 16/20 1.00
▸ KMT2A Q03164 16/20 1.00
▸ SMN1; SMN2 Q16637 3/20 0.81
▸ POLB P06746 4/20 0.80
▸ MAPT P10636 7/20 0.71
▸ MMP13 P45452 2/20 0.71
▸ CASP1 P29466 2/20 0.65
▸ HSD17B10 Q99714 2/20 0.65
▸ LMNA P02545 1/20 0.65
▸ HPGD P15428 1/20 0.65
▸ ALOX15 P16050 1/20 0.65
▸ ALOX12 P18054 1/20 0.65
▸ CASP7 P55210 1/20 0.65
▸ ALDH1A1 P00352 5/20 0.64
▸ TDP1 Q9NUW8 4/20 0.64
▸ GFER P55789 1/20 0.64
▸ NPSR1 Q6W5P4 3/20 0.62
▸ NPC1 O15118 1/20 0.58
▸ MAPK1 P28482 1/20 0.57
▸ L3MBTL1 Q9Y468 1/20 0.57

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10036060 1.00 MEN1 (1.00) MEN1KMT2ASMN1; SMN2POLBMAPT
SCHEMBL8887899 1.00 MEN1 (1.00) MEN1KMT2ASMN1; SMN2POLBMAPT
SCHEMBL11278635 0.90 MEN1 (1.00) MEN1KMT2ASMN1; SMN2POLBMAPT
SCHEMBL11555123 0.90 MEN1 (1.00) MEN1KMT2ASMN1; SMN2POLBMAPT
SCHEMBL2333246 0.89 MEN1 (0.81) MEN1KMT2ASMN1; SMN2POLBMAPT
SCHEMBL15995453 0.89 MEN1 (0.81) MEN1KMT2ASMN1; SMN2POLBMAPT
SCHEMBL2333243 0.89 MEN1 (0.81) MEN1KMT2ASMN1; SMN2POLBMAPT
SCHEMBL9191085 0.89 MEN1 (0.80) MEN1KMT2ASMN1; SMN2POLBMAPT
SCHEMBL9191082 0.89 MEN1 (0.80) MEN1KMT2ASMN1; SMN2POLBMAPT
SCHEMBL194201 0.88 MEN1 (0.78) MEN1KMT2ASMN1; SMN2POLBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0233396-B1 SILVER HALIDE PHOTOGRAPHIC EMULSIONS WITH NOVEL GRAIN FACES (4) EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1991-07-31 — — EP claimed
US-4724200-A CRYSTAL STRUCTURE EASTMAN KODAK COMPANY (US) 1988-02-09 — — US claimed
EP-0672953-B1 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium TOPPAN PRINTING CO LTD (JP) 2003-01-15 — — EP disclosed
US-6045953-A COMPRISES A SUBSTRATE, A PHOTOSENSITIVE LAYER FORMED ON THE SUBSTRATE BY COATING A PHOTOSENSITIVE SOLUTION CONTAINING AN ALICYCLIC, SOLVENT SOLUBLE, CATIONIC POLYMERIZABLE EPOXY RESIN AND AN ACRYLATE POLYMER TOPPAN PRINTING CO., LTD. (JP) 2000-04-04 — — US disclosed
EP-0697631-B1 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium TOPPAN PRINTING CO LTD (JP) 1998-06-10 — — EP disclosed
US-5698345-A CATIONIC POLYMERIZATION OF THERMOSETTING EPOXY OLIGOMER TOPPAN PRINTING CO., LTD. (JP) 1997-12-16 — — US disclosed
EP-0697631-A1 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium Toppan Printing Co., Ltd. (JP) 1996-02-21 — — EP disclosed
EP-0672953-A2 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium Toppan Printing Co., Ltd. (JP) 1995-09-20 — — EP disclosed
US-4724200-A CRYSTAL STRUCTURE EASTMAN KODAK COMPANY (US) 1988-02-09 — — US disclosed
US-4680255-A Emulsions and photographic elements containing silver halide grains having tetrahexahedral crystal faces EASTMAN KODAK COMPANY (US) 1987-07-14 — — US disclosed
US-4680256-A Emulsions and photographic elements containing silver halide grains having trisoctahedra crystal faces EASTMAN KODAK COMPANY (US) 1987-07-14 — — US disclosed
US-4680254-A Emulsions and photographic elements containing silver halide grains having hexoctamedral crystal faces EASTMAN KODAK COMPANY (US) 1987-07-14 — — US disclosed
US-4356247-A LITHOGRAPHY; PRINTING PLATES; PHOTORESISTS; HIGH-SPEED SENSITIZERS; SOTRAGE STABILITY FUJI PHOTO FILM CO., LTD. (JP) 1982-10-26 — — US disclosed
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