SCHEMBL7019669

SCHEMBL7019669

COc1cc(OC)c2cc(C(C)=O)c(=O)oc2c1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.59
MAOB P27338 6/20 0.59
HPGD P15428 4/20 0.59
GAA P10253 3/20 0.59
KDM4E B2RXH2 6/20 0.56
GLA P06280 3/20 0.54
HSD17B10 Q99714 3/20 0.54
CYP3A4 P08684 2/20 0.54
L3MBTL1 Q9Y468 1/20 0.54
MAOA P21397 1/20 0.54
HSD11B1 P28845 1/20 0.51
MAPT P10636 2/20 0.46
SLC16A3 O15427 1/20 0.46
MEN1 O00255 1/20 0.46
LMNA P02545 1/20 0.46
KMT2A Q03164 1/20 0.46
CA9 Q16790 3/20 0.44
CA12 O43570 2/20 0.44
CNR2 P34972 1/20 0.44
CYP1A2 P05177 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29436270 0.90 ALDH1A1 (0.55) ALDH1A1MAOBHPGDGAAKDM4E
SCHEMBL556704 0.90 ALDH1A1 (0.55) ALDH1A1MAOBHPGDGAAKDM4E
SCHEMBL11261487 0.88 SLC16A3 (0.59) ALDH1A1MAOBHPGDGAAKDM4E
SCHEMBL16267329 0.87 MAOB (0.53) ALDH1A1MAOBHPGDGAAKDM4E
SCHEMBL1366516 0.86 MAOB (0.52) ALDH1A1MAOBHPGDGAAKDM4E
SCHEMBL23239278 0.85 MAOB (0.51) ALDH1A1MAOBHPGDGAAKDM4E
SCHEMBL28728305 0.85 MAOB (0.51) ALDH1A1MAOBHPGDGAAKDM4E
SCHEMBL20711137 0.83 CNR2 (0.55) ALDH1A1MAOBHPGDGAAKDM4E
SCHEMBL17999243 0.83 MAOB (0.50) ALDH1A1MAOBHPGDGAAKDM4E
SCHEMBL2992219 0.82 MEN1 (0.59) ALDH1A1MAOBHPGDGAAKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0672953-B1 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium TOPPAN PRINTING CO LTD (JP) 2003-01-15 EP disclosed
US-6045953-A COMPRISES A SUBSTRATE, A PHOTOSENSITIVE LAYER FORMED ON THE SUBSTRATE BY COATING A PHOTOSENSITIVE SOLUTION CONTAINING AN ALICYCLIC, SOLVENT SOLUBLE, CATIONIC POLYMERIZABLE EPOXY RESIN AND AN ACRYLATE POLYMER TOPPAN PRINTING CO., LTD. (JP) 2000-04-04 US disclosed
EP-0697631-B1 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium TOPPAN PRINTING CO LTD (JP) 1998-06-10 EP disclosed
US-5698345-A CATIONIC POLYMERIZATION OF THERMOSETTING EPOXY OLIGOMER TOPPAN PRINTING CO., LTD. (JP) 1997-12-16 US disclosed
EP-0697631-A1 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium Toppan Printing Co., Ltd. (JP) 1996-02-21 EP disclosed
EP-0672953-A2 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium Toppan Printing Co., Ltd. (JP) 1995-09-20 EP disclosed
EP-0276016-B1 PHOTOPOLYMERIZABLE COMPOSITION Nippon Paint Co., Ltd. (JP) 1992-08-12 EP disclosed
US-4965171-A POLYMERIZABLE, ETHYLENICALLY UNSATURATED COMPONENT WITH PHOTOINITIATOR OF COUMARIN DYE, DIARYLIODONIUM SALT AND AMINE OR THIOPHENOXYACETIC ACID NIPPON PAINT CO., LTD. (JP) 1990-10-23 US disclosed
US-4950581-A HIGH PHOTOSENSITIVITY; USING PHOTOINITIATOR FUJI PHOTO FILM CO., LTD. (JP) 1990-08-21 US disclosed
US-4868092-A SENSITIVE TO VISIBLE LIGHT, XANTHENE DYE INITIATOR NIPPON PAINT CO., LTD. (JP) 1989-09-19 US disclosed
EP-0276016-A2 Photopolymerizable composition Nippon Paint Co., Ltd. (JP) 1988-07-27 EP disclosed
US-4505793-A INITIATOR IS BLEND OF 3-KETO-SUBSTITUTED CUMARIN AND HALOGEN COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1985-03-19 US disclosed