SCHEMBL7023819

SCHEMBL7023819

COc1ccc(C2=CC3=CC4=NC(=CC5=NC(=CC6=NC(=C(c7ccc(OC)c(OC)c7)C2=N3)C(c2ccc(OC)c(OC)c2)=C6c2ccc(OC)c(OC)c2)C=C5)C=C4)cc1OC

nearest known ligand 0.32

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 1/20 0.32
▸ MAPT P10636 1/20 0.32
▸ THRB P10828 1/20 0.32
▸ CYP19A1 P11511 1/20 0.30
▸ PDE4A P27815 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL606305 0.90 POLB (0.33) KDM4EMAPT
SCHEMBL8038380 0.83 KDM4E (0.33) KDM4EMAPT
SCHEMBL2951402 0.82 PDE4A (0.36) KDM4EMAPTTHRBPDE4A
Hydrochloric Acid SCHEMBL5537163 0.82 KDM4E (0.33) KDM4EMAPT
SCHEMBL22389534 0.79 — —
SCHEMBL28868074 0.78 — —
SCHEMBL28868085 0.78 HSD17B1 (0.32) —
SCHEMBL28959483 0.78 ESR1 (0.32) —
SCHEMBL28959479 0.78 ESR2 (0.32) —
SCHEMBL19718138 0.77 SETD7 (0.39) KDM4EMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0672953-B1 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium TOPPAN PRINTING CO LTD (JP) 2003-01-15 — — EP disclosed
US-6045953-A COMPRISES A SUBSTRATE, A PHOTOSENSITIVE LAYER FORMED ON THE SUBSTRATE BY COATING A PHOTOSENSITIVE SOLUTION CONTAINING AN ALICYCLIC, SOLVENT SOLUBLE, CATIONIC POLYMERIZABLE EPOXY RESIN AND AN ACRYLATE POLYMER TOPPAN PRINTING CO., LTD. (JP) 2000-04-04 — — US disclosed
EP-0697631-B1 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium TOPPAN PRINTING CO LTD (JP) 1998-06-10 — — EP disclosed
US-5698345-A CATIONIC POLYMERIZATION OF THERMOSETTING EPOXY OLIGOMER TOPPAN PRINTING CO., LTD. (JP) 1997-12-16 — — US disclosed
EP-0697631-A1 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium Toppan Printing Co., Ltd. (JP) 1996-02-21 — — EP disclosed
EP-0672953-A2 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium Toppan Printing Co., Ltd. (JP) 1995-09-20 — — EP disclosed
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