Acrylic Acid

Acrylic Acid

SCHEMBL7024979

C=C(CC)C(=O)O.C=CC(=O)O.C=CCl

nearest known ligand 0.54

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Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 1/20 0.54
HSD17B10 Q99714 1/20 0.54
LMNA P02545 1/20 0.43
ALDH1A1 P00352 3/20 0.41
TSHR P16473 2/20 0.41
TET2 Q6N021 4/20 0.33
FFAR3 O14843 1/20 0.32
TET3 O43151 1/20 0.31
TET1 Q8NFU7 1/20 0.31
GRIK1 P39086 1/20 0.30
GRIK2 Q13002 1/20 0.30
GRM1 Q13255 1/20 0.30
GRM2 Q14416 1/20 0.30
MAPK1 P28482 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL277486 0.93 ALOX15 (0.60) ALOX15HSD17B10LMNAALDH1A1TSHR
Vinyl Chloride SCHEMBL277644 0.93 ALOX15 (0.43) ALOX15HSD17B10LMNAALDH1A1TSHR
Acrylic Acid SCHEMBL28411354 0.93 ALOX15 (0.60) ALOX15HSD17B10LMNAALDH1A1TSHR
1,1-Dichloroethene SCHEMBL8395790 0.89 ALOX15 (0.40) ALOX15HSD17B10ALDH1A1TSHRTET2
Methacrylic Acid SCHEMBL7745086 0.87 ALOX15 (0.54) ALOX15HSD17B10LMNAALDH1A1TSHR
Acrylic Acid SCHEMBL15240328 0.87 ALOX15 (0.59) ALOX15HSD17B10LMNAALDH1A1TSHR
SCHEMBL3429164 0.82 ALDH1A1 (0.48) ALOX15HSD17B10LMNAALDH1A1TSHR
Acrylic Acid SCHEMBL8590070 0.82 ALOX15 (0.48) ALOX15HSD17B10LMNAALDH1A1TSHR
Butadiene SCHEMBL501646 0.81 ALOX15 (0.44) ALOX15HSD17B10LMNAALDH1A1TSHR
Methacrylic Acid SCHEMBL16666788 0.81 ALOX15 (0.44) ALOX15HSD17B10LMNAALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6551770-B2 For photomechanical process; support, a first layer of an organic silver salt, photosensitive silver halide and a reducing agent, and a second layer whose viscosity is higher at cooler temperatures than at warmer temperatures KONICA CORPORATION (JP) 2003-04-22 US disclosed
US-20020018970-A1 Heat developable photosensitive material KONICA CORPORATION 2002-02-14 US disclosed
EP-1168067-A2 Heat developable photosensitive material KONICA CORPORATION (JP) 2002-01-02 EP disclosed