Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26362926 | 0.98 | TSHR (0.39) | TSHRTHRBALDH1A1 | |
| SCHEMBL13040455 | 0.95 | TSHR (0.41) | TSHRTHRBALDH1A1 | |
| SCHEMBL246414 | 0.93 | TSHR (0.45) | TSHRTHRBALDH1A1 | |
| SCHEMBL248056 | 0.91 | TSHR (0.44) | TSHRTHRBALDH1A1 | |
| SCHEMBL247163 | 0.91 | TSHR (0.44) | TSHRTHRBALDH1A1 | |
| SCHEMBL246347 | 0.91 | TSHR (0.44) | TSHRTHRBALDH1A1 | |
| SCHEMBL246497 | 0.91 | TSHR (0.44) | TSHRTHRBALDH1A1 | |
| SCHEMBL248332 | 0.91 | TSHR (0.44) | TSHRTHRBALDH1A1 | |
| SCHEMBL248380 | 0.91 | TSHR (0.44) | TSHRTHRBALDH1A1 | |
| SCHEMBL246626 | 0.89 | TSHR (0.45) | TSHRTHRBALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9529259-B2 | Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound | JSR CORPORATION (JP) | 2016-12-27 | — | — | US | disclosed |
| US-9329474-B2 | Photoresist composition and resist pattern-forming method | JSR CORPORATION (JP) | 2016-05-03 | — | — | US | disclosed |
| US-20150355539-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | JSR CORPORATION (JP) | 2015-12-10 | — | — | US | disclosed |
| US-9158196-B2 | Radiation-sensitive resin composition and pattern-forming method | JSR CORPORATION (JP) | 2015-10-13 | — | — | US | disclosed |
| US-9046765-B2 | Resist pattern-forming method, resist pattern-forming radiation-sensitive resin composition, and resist film | JSR CORPORATION (JP) | 2015-06-02 | — | — | US | disclosed |
| US-8765355-B2 | Radiation sensitive resin composition, method for forming a pattern, polymer and compound | JSR CORPORATION (JP) | 2014-07-01 | — | — | US | disclosed |
| US-8669042-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2014-03-11 | — | — | US | disclosed |
| US-8647810-B2 | Resist lower layer film-forming composition, polymer, resist lower layer film, pattern-forming method, and method of producing semiconductor device | JSR CORPORATION (JP) | 2014-02-11 | — | — | US | disclosed |
| US-20140023968-A1 | RESIST PATTERN-FORMING METHOD, RESIST PATTERN-FORMING RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM | JSR CORPORATION (JP) | 2014-01-23 | — | — | US | disclosed |
| US-20130280657-A1 | PHOTORESIST COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2013-10-24 | — | — | US | disclosed |
| US-8431324-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20130078571-A1 | PHOTORESIST COMPOSITION, METHOD FOR PRODUCING PHOTORESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20120276482-A1 | RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN, POLYMER AND COMPOUND | JSR CORPORATION (JP) | 2012-11-01 | — | — | US | disclosed |
| US-20120183908-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| US-8182977-B2 | Polymer and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-8124314-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20110212401-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2011-09-01 | — | — | US | disclosed |
| US-20100285405-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-11-11 | — | — | US | disclosed |
| US-20100239981-A1 | POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120276482-A1 | RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN, POLYMER AND COMPOUND | RAD51, MRE11, RER1 | TSHR 4589/4885THRB 4556/4885ALDH1A1 1414/4885 |
| US-20150355539-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | RER1, MSR1, MRPS35 | TSHR 1775/4885THRB 3815/4885ALDH1A1 2285/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.