⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL703209 | 0.79 | ALDH1A1 (0.35) | — | |
| SCHEMBL8854498 | 0.73 | — | — | |
| SCHEMBL8707469 | 0.73 | — | — | |
| SCHEMBL1778033 | 0.69 | ALDH1A1 (0.40) | — | |
| SCHEMBL38901 | 0.69 | ALDH1A1 (0.40) | — | |
| SCHEMBL704391 | 0.67 | CA4 (0.38) | — | |
| SCHEMBL28331870 | 0.67 | CA4 (0.36) | — | |
| Hydrochloric Acid SCHEMBL6905007 | 0.67 | ALDH1A1 (0.38) | — | |
| SCHEMBL28546150 | 0.67 | ALDH1A1 (0.38) | — | |
| SCHEMBL21838773 | 0.67 | ALDH1A1 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107428891-B | Curable composition | 施敏打硬株式会社 | 2021-04-20 | — | — | CN | disclosed |
| CN-105392845-B | Photocurable composition | 思美定株式会社 | 2020-10-20 | — | — | CN | disclosed |
| EP-3081612-B1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | CEMEDINE CO LTD (JP) | 2018-11-14 | — | — | EP | disclosed |
| US-9718999-B2 | Photocurable composition having adhesive properties | CEMEDINE CO., LTD (JP) | 2017-08-01 | — | — | US | disclosed |
| US-20160312089-A1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | CEMEDINE CO., LTD. (JP) | 2016-10-27 | — | — | US | disclosed |
| EP-3081612-A1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | Cemedine Co., Ltd. (JP) | 2016-10-19 | — | — | EP | disclosed |
| US-20160152783-A1 | PHOTOCURABLE COMPOSITION | CEMEDINE CO., LTD. (JP) | 2016-06-02 | — | — | US | disclosed |
| EP-3023462-A1 | PHOTOCURABLE COMPOSITION | Cemedine Co., Ltd. (JP) | 2016-05-25 | — | — | EP | disclosed |
| CN-105392845-A | Photocurable composition | CEMEDINE CO LTD | 2016-03-09 | — | — | CN | disclosed |
| US-8124690-B2 | Moisture curable polymer having SiF group, and curable composition containing the same | KANEKA CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090275702-A1 | MOISTURE CURABLE POLYMER HAVING SiF GROUP, AND CURABLE COMPOSITION CONTAINING THE SAME | KANEKA CORPORATION (JP) | 2009-11-05 | — | — | US | disclosed |
| EP-2062929-A1 | MOISTURE-CURABLE POLYMER HAVING SiF GROUP AND CURABLE COMPOSITION CONTAINING THE SAME | Kaneka Corporation (JP) | 2009-05-27 | — | — | EP | disclosed |