SCHEMBL703492

SCHEMBL703492

COc1cccc([SiH2]CCCC[SiH2]c2cccc(OC)c2OC)c1OC

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.50
NFE2L2 Q16236 5/20 0.38
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
CA4 P22748 1/20 0.38
CA7 P43166 1/20 0.38
CA9 Q16790 1/20 0.38
CA14 Q9ULX7 1/20 0.38
HPGD P15428 1/20 0.38
MAPK1 P28482 1/20 0.38
MEN1 O00255 3/20 0.37
KMT2A Q03164 3/20 0.37
KDM4E B2RXH2 1/20 0.37
MAPT P10636 1/20 0.37
HSD17B10 Q99714 1/20 0.37
ALDH1A1 P00352 1/20 0.37
CYP1A2 P05177 1/20 0.37
CYP2D6 P10635 1/20 0.37
ALOX5 P09917 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL647735 0.96 SMN1; SMN2 (0.50) SMN1; SMN2NFE2L2CA12CA1CA2
SCHEMBL702408 0.92 SMN1; SMN2 (0.48) SMN1; SMN2NFE2L2CA12CA1CA2
SCHEMBL5438793 0.91 SMN1; SMN2 (0.46) SMN1; SMN2NFE2L2CA12CA1CA2
SCHEMBL5413359 0.91 SMN1; SMN2 (0.42) SMN1; SMN2NFE2L2HPGDMAPK1MEN1
SCHEMBL5420335 0.91 SMN1; SMN2 (0.42) SMN1; SMN2NFE2L2CA12CA1CA2
SCHEMBL5417644 0.91 SMN1; SMN2 (0.42) SMN1; SMN2NFE2L2CA12CA1CA2
SCHEMBL5417193 0.91 SMN1; SMN2 (0.42) SMN1; SMN2NFE2L2CA12CA1CA2
SCHEMBL5410271 0.89 SMN1; SMN2 (0.41) SMN1; SMN2NFE2L2HPGDMAPK1MEN1
SCHEMBL5410299 0.89 SMN1; SMN2 (0.41) SMN1; SMN2NFE2L2HPGDMAPK1MEN1
SCHEMBL5414850 0.89 SMN1; SMN2 (0.41) SMN1; SMN2NFE2L2HPGDMAPK1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed