Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3482343 | 0.92 | TSHR (0.30) | TSHRSMN1; SMN2DNM1 | |
| SCHEMBL15847385 | 0.92 | OPRM1 (0.38) | DNM1 | |
| SCHEMBL15847575 | 0.90 | OPRM1 (0.37) | TSHRDNM1 | |
| SCHEMBL2494558 | 0.90 | OPRM1 (0.37) | TSHRDNM1 | |
| SCHEMBL15847149 | 0.90 | OPRM1 (0.37) | TSHRDNM1 | |
| SCHEMBL15847525 | 0.90 | OPRM1 (0.37) | TSHRDNM1 | |
| SCHEMBL3481425 | 0.87 | TSHR (0.32) | TSHRSMN1; SMN2DNM1 | |
| SCHEMBL15302504 | 0.84 | — | — | |
| SCHEMBL702933 | 0.78 | FDPS (0.32) | — | |
| SCHEMBL29201641 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024232632-A1 | TRANSITION METAL SUPPORTED CATALYST WITH IMPROVED HYDROGENATION ACTIVITY AND USE THEREOF | 한양대학교 산학협력단 | 2024-11-14 | — | — | WO | claimed |
| US-20150329727-A1 | A COATING COMPOSITION, A PREPARATION METHOD THEREFORE, AND USE THEREOF | AKZO NOBEL COATINGS INTERNATIONAL B.V. (NL) | 2015-11-19 | — | — | US | claimed |
| EP-2938753-A1 | A COATING COMPOSITION, A PREPARATION METHOD THEREFORE, AND USE THEREOF | Akzo Nobel Coatings International B.V. (NL) | 2015-11-04 | — | — | EP | claimed |
| WO-2014102166-A9 | A COATING COMPOSITION, A PREPARATION METHOD THEREFORE, AND USE THEREOF | AKZO NOBEL COATINGS INTERNATIONAL B.V. (NL) | 2014-09-18 | — | — | WO | claimed |
| WO-2014102166-A1 | A COATING COMPOSITION, A PREPARATION METHOD THEREFORE, AND USE THEREOF | AKZO NOBEL COATINGS INTERNATIONAL B.V. (NL) | 2014-07-03 | — | — | WO | claimed |
| WO-2024232632-A1 | TRANSITION METAL SUPPORTED CATALYST WITH IMPROVED HYDROGENATION ACTIVITY AND USE THEREOF | 한양대학교 산학협력단 | 2024-11-14 | — | — | WO | disclosed |
| EP-2154710-B1 | Substrate joining method and 3-D semiconductor device | SHINETSU CHEMICAL CO (JP) | 2016-11-16 | — | — | EP | disclosed |
| US-20150329727-A1 | A COATING COMPOSITION, A PREPARATION METHOD THEREFORE, AND USE THEREOF | AKZO NOBEL COATINGS INTERNATIONAL B.V. (NL) | 2015-11-19 | — | — | US | disclosed |
| EP-2938753-A1 | A COATING COMPOSITION, A PREPARATION METHOD THEREFORE, AND USE THEREOF | Akzo Nobel Coatings International B.V. (NL) | 2015-11-04 | — | — | EP | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| WO-2014102166-A9 | A COATING COMPOSITION, A PREPARATION METHOD THEREFORE, AND USE THEREOF | AKZO NOBEL COATINGS INTERNATIONAL B.V. (NL) | 2014-09-18 | — | — | WO | disclosed |
| WO-2014102166-A1 | A COATING COMPOSITION, A PREPARATION METHOD THEREFORE, AND USE THEREOF | AKZO NOBEL COATINGS INTERNATIONAL B.V. (NL) | 2014-07-03 | — | — | WO | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| EP-2116563-A1 | CATALYST FOR DEALCOHOLIZATION CONDENSATION REACTION AND METHOD FOR PRODUCING ORGANOPOLYSILOXANE USING THE SAME | Dow Corning Toray Co., Ltd. (JP) | 2009-11-11 | — | — | EP | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| EP-0310320-B1 | Curable composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1994-12-28 | — | — | EP | disclosed |
| US-4923948-A | Curable composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1990-05-08 | — | — | US | disclosed |
| EP-0310320-A2 | Curable composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1989-04-05 | — | — | EP | disclosed |