SCHEMBL703910

SCHEMBL703910

CCCC(CCC)(CCC)CCO[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3482720 0.91 CYP3A4 (0.30)
SCHEMBL3482342 0.91 CYP3A4 (0.30)
SCHEMBL3481813 0.90
SCHEMBL3481558 0.90
SCHEMBL703975 0.84
SCHEMBL703679 0.84 ADRB2 (0.31)
SCHEMBL15847383 0.84 TSHR (0.33)
SCHEMBL15847148 0.82 TSHR (0.38)
SCHEMBL15847524 0.82 TSHR (0.38)
SCHEMBL15847574 0.82 TSHR (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 156 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024232632-A1 TRANSITION METAL SUPPORTED CATALYST WITH IMPROVED HYDROGENATION ACTIVITY AND USE THEREOF 한양대학교 산학협력단 2024-11-14 WO claimed
CN-114989722-A Hydrophobic and oleophobic, non-sticky and oil-stain-resistant easy-to-clean coating and coating preparation method 苏州图纳新材料科技有限公司 2022-09-02 CN claimed
US-20150329727-A1 A COATING COMPOSITION, A PREPARATION METHOD THEREFORE, AND USE THEREOF AKZO NOBEL COATINGS INTERNATIONAL B.V. (NL) 2015-11-19 US claimed
EP-2938753-A1 A COATING COMPOSITION, A PREPARATION METHOD THEREFORE, AND USE THEREOF Akzo Nobel Coatings International B.V. (NL) 2015-11-04 EP claimed
WO-2014102166-A9 A COATING COMPOSITION, A PREPARATION METHOD THEREFORE, AND USE THEREOF AKZO NOBEL COATINGS INTERNATIONAL B.V. (NL) 2014-09-18 WO claimed
WO-2014102166-A1 A COATING COMPOSITION, A PREPARATION METHOD THEREFORE, AND USE THEREOF AKZO NOBEL COATINGS INTERNATIONAL B.V. (NL) 2014-07-03 WO claimed
US-7129311-B2 Additives to prevent degradation of alkyl-hydrogen siloxanes ARCH SPECIALTY CHEMICALS, INC. (US) 2006-10-31 US claimed
US-20060159861-A1 Additives to prevent degradation of alkyl-hydrogen siloxanes ARCH SPECIALTY CHEMICALS, INC. (US) 2006-07-20 US claimed
EP-1573086-A2 ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES Arch Specialty Chemicals, Inc. (US) 2005-09-14 EP claimed
US-20040127070-A1 Additives to prevent degradation of alkyl-hydrogen siloxanes ARCH SPECIALTY CHEMICALS, INC. 2004-07-01 US claimed
WO-2004027110-A2 ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES ARCH SPECIALTY CHEMICALS, INC. (US) 2004-04-01 WO claimed
US-12473455-B2 Polymer-coated substrate and medical analysis device SUMITOMO RUBBER INDUSTRIES, LTD. (JP) 2025-11-18 US disclosed
CN-120041084-A Organosilicon coating and preparation method and application thereof 广东美的制冷设备有限公司 2025-05-27 CN disclosed
US-20250101226-A1 THIXOTROPIC SILICONE GEL COMPOSITION, SILICONE GEL CURED PRODUCT, AND ELECTRICAL/ELECTRONIC COMPONENTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-03-27 US disclosed
US-20250026962-A1 COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME SOULBRAIN CO., LTD. (KR) 2025-01-23 US disclosed
US-6489501-B2 REACTING A TRANSITION METAL HYDRIDE WITH A STARTING SILANE SUCH AS TETRAPHENOXYSILANE IN A PRESENCE OF A CATALYST; AVOIDS USING THE COSTLY ENERGY CONSUMING REDUCTION OF SILICON DIOXIDE TO ELEMENTAL SILICON GENERAL ELECTRIC COMPANY 2002-12-03 US disclosed
US-20020161254-A1 METHOD AND APPARATUS FOR FORMING A CARBON-SILICON BOND IN A SILANE GENERAL ELECTRIC COMPANY 2002-10-31 US disclosed
EP-1236731-A1 Method and apparatus for forming a carbon-silicon bond in a silane GENERAL ELECTRIC COMPANY (US) 2002-09-04 EP disclosed
US-6344579-B1 REACTION OF FLUOROSILICON COMPOUND WITH REACTION OF SILICON WITH HYDROXY, ALKOXY OR ARYLOXY GROUP WITH DIFLUORODIAMINO COMPOUND MITSUI CHEMICALS, INC. (JP) 2002-02-05 US disclosed
EP-1138633-A1 PROCESS FOR PRODUCING FLUORINATED SILICON COMPOUND Mitsui Chemicals, Inc. (JP) 2001-10-04 EP disclosed